SBIR Phase II: Real-Time Sensor for Control of Deposits on Etch and Chemical Vapor Deposition Chamber Walls in IC Manufacture

SBIR 第二阶段：用于控制 IC 制造中蚀刻和化学气相沉积室壁沉积物的实时传感器

• 批准号: 9901714
• 负责人: Fred Stanke
• 金额: $ 40万
• 依托单位: Sensys Instruments Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1999
• 资助国家: 美国
• 起止时间: 1999-07-15 至 2002-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9901714&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Real; Time

This Small Business Innovation Research Phase II will provide IC manufacturers with a real-time sensor to optimize the efficiency of their Plasma Etch and Chemical Vapor Deposition (CVD) chambers. Etch and CVD are the staples of semiconductor manufacturing. In both, deposits accumulate on chamber walls, eventually flake off and cause particle defects that reduce yields. The manufactures control defects with periodic chamber cleans, and thereby decrease the availability of their expensive tools. Cleaning schedules are currently set conservatively and statistically. The state-of-the-art ultrasonic Sensys Sensor has three competitive advantages: (1) it measures precisely the naturally occurring deposits inside the chamber; (2) exterior mounting eliminates the possibility of contaminating the plasma environment; and (3) it measures the wall temperature and erosion. The objectives of this project are to develop the sensor, mount it on chambers and to demonstrate that the sensor allows the manufacturer to clean the chambers when and only they need it, thus optimizing the tradeoff between yield and utilization. The ultimate market size for the wall sensor, based on the number of chambers sold, exceeds $100M/year. The initial market is about $0.5M in 1999, and will grow to $90M by 2003.

这个小型企业创新研究第二阶段将为 IC 制造商提供实时传感器，以优化其等离子蚀刻和化学气相沉积 (CVD) 室的效率。 蚀刻和 CVD 是半导体制造的主要技术。 在这两种情况下，沉积物都会积聚在室壁上，最终剥落并导致颗粒缺陷，从而降低产量。 制造商通过定期清洁室来控制缺陷，从而降低了昂贵工具的可用性。 目前，清洁时间表是保守且统计性设定的。 最先进的超声波 Sensys 传感器具有三大竞争优势：(1) 精确测量室内自然产生的沉积物； (2)外部安装消除了污染等离子体环境的可能性； (3)测量壁温和侵蚀。 该项目的目标是开发传感器，将其安装在腔室上，并证明传感器允许制造商在且仅需要时清洁腔室，从而优化产量和利用率之间的权衡。 根据销售的腔室数量，墙壁传感器的最终市场规模超过每年 1 亿美元。 1999 年最初的市场规模约为 50 万美元，到 2003 年将增长到 9000 万美元。