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Defect Characterization and Engineering in Semi-Insulating II-VI Materials

Defect Characterization and Engineering in Semi-Insulating II-VI Materials
半绝缘 II-VI 材料的缺陷表征和工程
批准号:
9802712
负责人:
Kelvin Lynn
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1998
资助国家:
美国
项目状态:
已结题
起止时间:
1998-07-01 至 2002-06-30

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中文摘要
翻译
9802712林恩这个大学/工业合作GOALI项目的目的是更好地了解的性质和性质的缺陷,控制的电气和载流子捕获性能的半绝缘(SI)碲锌镉。该方法涉及系统的研究,以了解他们的作用,电补偿和载流子捕获的高纯度硅CdZnTe熔体生长的布里奇曼技术的晶格缺陷。掺杂和生长实验与热刺激和正电子湮没光谱将结合起来,以确定缺陷,并确定其陷阱参数。将研究所选杂质的掺入和缺陷的形成作为生长条件的函数,以确定控制缺陷形成和掺入的关键热力学参数。杂质的浓度将通过辉光放电质谱和共振电离增强质谱测量,并与热谱和正电子湮没相关。红外显微镜和吸收将被用来研究镉和碲沉淀物的形成和它们对杂质的掺入和缺陷复合物的形成的影响。将进行退火实验,以研究主要缺陷的扩散特性,并提供更好地理解凝固后晶体冷却期间的缺陷扩散和形成。该项目由DMR电子材料计划和MPS OMA(多学科活动办公室)共同支持。本项目涉及材料科学领域的基础研究问题,具有技术相关性。从研究中获得的基本知识和理解预计将有助于提高先进设备的性能和稳定性,为设计和生产改进的材料和材料组合提供基本的理解和基础。该计划的一个重要特点是研究和教育的整合,通过该项目的GOALI方面为学术人员提供重要的教育机会,体验学术和工业研究方法和环境。***
英文摘要
9802712 Lynn This University/Industry collaborative GOALI project aims for greater understanding of the nature and properties of the defects governing the electrical and carrier trapping properties of semi- insulating(SI) CdZnTe. The approach involves systematic study of lattice defects in high-purity SI CdZnTe grown from melt by Bridgman techniques in order to understand their role in electrical compensation and carrier trapping. Doping and growth experiments with thermally stimulated and positron annihilation spectroscopies will be combined to identify defects and determine their trapping parameters. The incorporation of selected impurities and the formation of defects as a function of growth conditions will be studied to determine key thermodynamic parameters controlling defect formation and incorporation. The concentration of impurities will be measured by glow-discharge mass spectroscopy and resonance-ionization enhanced mass spectroscopy and correlated with thermal spectroscopies and positron annihilation. Infrared microscopy and absorption will be used to study the formation of Cd and Te precipitates and their effect on the incorporation of impurities and the formation of defect complexes. Annealing experiments will be conducted to shed study diffusion properties of dominant defects and provide a better understanding of defect diffusion and formation during cooling of the crystals following solidification. The project is co-supported by the DMR Electronic Materials Program and the MPS OMA(Office of Multidisciplinary Activities). %%% Basic research issues in a topical area of materials science having technological relevance are addressed by this project. The basic knowledge and understanding gained from the research is expected to contribute to improving the performance and stability of advanced devices by providing a fundamental understanding and a basis for designing and producing improved materials, and materials combinations. An important feature of the program is the integration of research and education by providing an important educational opportunity through the GOALI aspect of the project for academic personnel to experience both academic and industrial research approaches and environments. ***
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