COMPETITION: Industry/University Cooperative Research Center for Microcontamination Control

竞赛：微污染控制产学合作研究中心

• 批准号: 9812843
• 负责人: Harold Parks
• 金额: $ 44万
• 依托单位: University of Arizona
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-09-01 至 2005-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9812843&HistoricalAwards=false
• 关键词: COMPETITION; Industry; University; Cooperative; Research

ABSTRACT EEC-9812843 O'HANLON The University of Arizona Industry/University Cooperative Research Center (I/UCRC) for Microcontamination Control is becoming a multi-university I/UCRC with the addition of Rensselaer Polytechnic Institute (RPI). The Center's research addresses contamination reduction in processes used to manufacture semiconductor chips. Meeting the announcement for competitive renewal and NSF Announcement 97-164, the RPI research site is expanding the Center's research agenda with significantly new intellectual substance through research addressing processes used in the manufacture of the upper layers of silicon devices and the relationship between contaminants and killer defects that reduce manufacturing yield. The research agenda of the new site will address 1.) Defect Analysis for Improved BEOL Yield Modeling, 2.) Control of Process-induced Particle Formation in Thin-film Plasma Processing, 3.) Defect Control During Chemical Mechanical Planarization, 4.) Post-CMP Cleaning of Copper Damascene Structures.

摘要EEC-9812843 O 'Hanlon 亚利桑那大学工业/大学微污染控制合作研究中心（I/UCRC）正在成为一个多大学I/UCRC，并增加了伦斯勒理工学院（RPI）。 该中心的研究致力于减少半导体芯片制造过程中的污染。 为了满足竞争性更新和NSF公告97-164的公告，RPI研究中心正在通过研究解决硅器件上层制造过程中使用的污染物和降低制造产量的致命缺陷之间的关系，扩展中心的研究议程。 新网站的研究议程将解决1。 用于改进的BEOL良率建模的缺陷分析，2.）薄膜等离子体处理中的处理引起的颗粒形成的控制，3.）化学机械平坦化期间的缺陷控制，4.）铜镶嵌结构的CMP后清洗。