COMPETITION: Industry/University Cooperative Research Center for Microcontamination Control

摘要EEC-9812850报告指出，随着伦斯勒理工学院的加入，亚利桑那大学微污染控制工业/大学合作研究中心正在成为一个多所大学的I/UCRC。该中心的研究致力于减少半导体芯片制造过程中的污染。为了满足竞争更新公告和NSF 97-164公告，RPI研究网站正在扩展该中心的研究议程，通过研究硅器件上层制造中使用的工艺以及污染物和降低制造产量的致命缺陷之间的关系来显著增加新的智力物质。新网站的研究议程将涉及1。)改进的BEOL成品率模型的缺陷分析2.薄膜等离子体加工中工艺诱导颗粒形成的控制，3。化学机械平整过程中的缺陷控制，4.大马士革铜结构的化学机械抛光后清洗。

ABSTRACT EEC-9812850 ROSE The University of Arizona Industry/University Cooperative Research Center (I/UCRC) for Microcontamination Control is becoming a multi-university I/UCRC with the addition of Rensselaer Polytechnic Institute (RPI). The Center's research addresses contamination reduction in processes used to manufacture semiconductor chips. Meeting the announcement for competitive renewal and NSF Announcement 97-164, the RPI research site is expanding the Center's research agenda with significantly new intellectual substance through research addressing processes used in the manufacture of the upper layers of silicon devices and the relationship between contaminants and killer defects that reduce manufacturing yield. The research agenda of the new site will address 1.) Defect Analysis for Improved BEOL Yield Modeling, 2.) Control of Process-induced Particle Formation in Thin-film Plasma Processing, 3.) Defect Control During Chemical Mechanical Planarization, 4.) Post-CMP Cleaning of Copper Damascene Structures.