COMPETITION: Industry/University Cooperative Research Center for Microcontamination Control

竞赛：微污染控制产学合作研究中心

• 批准号: 9812850
• 负责人: Kenneth Rose
• 金额: $ 30万
• 依托单位: Rensselaer Polytechnic Institute
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-09-01 至 2001-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9812850&HistoricalAwards=false
• 关键词: COMPETITION; Industry; University; Cooperative; Research

ABSTRACT EEC-9812850 ROSE The University of Arizona Industry/University Cooperative Research Center (I/UCRC) for Microcontamination Control is becoming a multi-university I/UCRC with the addition of Rensselaer Polytechnic Institute (RPI). The Center's research addresses contamination reduction in processes used to manufacture semiconductor chips. Meeting the announcement for competitive renewal and NSF Announcement 97-164, the RPI research site is expanding the Center's research agenda with significantly new intellectual substance through research addressing processes used in the manufacture of the upper layers of silicon devices and the relationship between contaminants and killer defects that reduce manufacturing yield. The research agenda of the new site will address 1.) Defect Analysis for Improved BEOL Yield Modeling, 2.) Control of Process-induced Particle Formation in Thin-film Plasma Processing, 3.) Defect Control During Chemical Mechanical Planarization, 4.) Post-CMP Cleaning of Copper Damascene Structures.

摘要 EEC-9812850 ROSE 随着伦斯勒理工学院 (RPI) 的加入，亚利桑那大学微污染控制工业/大学合作研究中心 (I/UCRC) 正在成为一个多大学 I/UCRC。 该中心的研究致力于减少半导体芯片制造工艺中的污染。 为了满足竞争性更新公告和 NSF 公告 97-164 的要求，RPI 研究站点正在通过研究解决硅器件上层制造中使用的工艺以及污染物与降低制造产量的致命缺陷之间的关系，以重要的新知识物质扩展该中心的研究议程。 新站点的研究议程将涉及 1.) 改进 BEOL 良率模型的缺陷分析，2.) 薄膜等离子体加工中工艺诱导颗粒形成的控制，3.) 化学机械平坦化过程中的缺陷控制，4.) 铜镶嵌结构的 CMP 后清洁。