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SBIR Phase I: A Trace Contaminant Sensor for Semiconductor Process Gases

SBIR Phase I: A Trace Contaminant Sensor for Semiconductor Process Gases
SBIR 第一阶段:用于半导体工艺气体的痕量污染物传感器
批准号:
9860484
负责人:
David Bomse
金额:
$10.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1999
资助国家:
美国
项目状态:
已结题
起止时间:
1999-01-01 至 1999-06-30

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中文摘要
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英文摘要
9860484 This Small Business Innovation Research Phase I project will develop an innovative sensor based on photoacoustic spectroscopy, for real-time detection of trace impurities important in microelectronics manufacturing. Gas feedback quality is an important measurement for any process control strategy because contaminants at the part per billion level can limit product yield. The unwanted components are often ubiquitous in air and can enter process tools along a variety of pathways. The sensor being developed should be useful for both corrosive and non-corrosive process gases, and will find application in virtually all microelectronic fabrication methods. Furthermore, such sensors may be sufficiently cost-effective that one might be installed at each process tool. Phase I experiments will focus upon trace moisture detection, and the associated tasks are designed to determine water vapor detection limits and to identify limiting noise sources.
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