SBIR Phase I: A Trace Contaminant Sensor for Semiconductor Process Gases

SBIR 第一阶段：用于半导体工艺气体的痕量污染物传感器

• 批准号: 9860484
• 负责人: David Bomse
• 金额: $ 10万
• 依托单位: Southwest Sciences Inc
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1999
• 资助国家: 美国
• 起止时间: 1999-01-01 至 1999-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9860484&HistoricalAwards=false
• 关键词: SBIR; Phase; Trace; Contaminant; Sensor

9860484 This Small Business Innovation Research Phase I project will develop an innovative sensor based on photoacoustic spectroscopy, for real-time detection of trace impurities important in microelectronics manufacturing. Gas feedback quality is an important measurement for any process control strategy because contaminants at the part per billion level can limit product yield. The unwanted components are often ubiquitous in air and can enter process tools along a variety of pathways. The sensor being developed should be useful for both corrosive and non-corrosive process gases, and will find application in virtually all microelectronic fabrication methods. Furthermore, such sensors may be sufficiently cost-effective that one might be installed at each process tool. Phase I experiments will focus upon trace moisture detection, and the associated tasks are designed to determine water vapor detection limits and to identify limiting noise sources.

9860484 该小型企业创新研究第一阶段项目将开发一种基于光声光谱的创新传感器，用于实时检测微电子制造中重要的微量杂质。 气体反馈质量是任何过程控制策略的重要测量，因为十亿分之一水平的污染物会限制产品产量。 不需要的成分通常在空气中无处不在，并且可以沿着沿着各种路径进入加工工具。 正在开发的传感器应该是有用的腐蚀性和非腐蚀性工艺气体，并将发现在几乎所有的微电子制造方法的应用。 此外，这样的传感器可以是足够成本有效的，使得可以在每个处理工具处安装一个传感器。 第一阶段的实验将集中在微量水分检测，和相关的任务，旨在确定水蒸气检测极限，并确定限制噪声源。