SBIR Phase II: A Trace Contaminant Sensor for Semiconductor Process Gases

SBIR 第二阶段：用于半导体工艺气体的痕量污染物传感器

• 批准号: 9983349
• 负责人: David Bomse
• 金额: $ 40万
• 依托单位: Southwest Sciences Inc
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2000
• 资助国家: 美国
• 起止时间: 2000-07-01 至 2002-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9983349&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Trace; Contaminant

This Small Business Innovation Research (SBIR) Phase II project will test a novel sensor for real-time detection of trace impurities important in micoelectronics manufacturing. Gas feedstock quality is an important measurement for any process control strategy because contamination at the part-per-billion (ppb) level may limit product yield. This project's technique, called wavelength modulated photo-acoustic spectroscopy, has the potential to achieve these detection levels at a significantly lower cost than is possible with current technology. This technology is compatible with both corrosive and non-corrosive gases. The Phase II will construct and field test a prototype trace moisture sensor that is expected to achieve 10-ppb detection limits in corrosive gases such as hydrogen chloride and ammonia.Potential commercial applications are expected in on-line removal of trace impurities important in micoelectronics manufacturing.

这个小型企业创新研究（SBIR）二期项目将测试一种新型传感器，用于实时检测微电子制造中重要的微量杂质。气体原料质量是任何过程控制策略的重要衡量标准，因为十亿分之一（ppb）水平的污染可能会限制产品产量。这个项目的技术被称为波长调制光声光谱，它有可能以比现有技术低得多的成本实现这些检测水平。该技术适用于腐蚀性气体和非腐蚀性气体。第二阶段将建造和现场测试一个原型微量水分传感器，预计在腐蚀性气体（如氯化氢和氨）中达到10 ppb的检测极限。潜在的商业应用有望在线去除微电子制造中重要的微量杂质。