U.S.-Japan Joint Seminar: Contribution of In Situ Electron Microscopy to Understanding and Creation of Advanced Materials
U.S.-Japan Joint Seminar: Contribution of In Situ Electron Microscopy to Understanding and Creation of Advanced Materials
批准号:
9981689
负责人:
Robert Sinclair
金额:
$2.63万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-06-01 至 2001-05-31
中文摘要
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英文摘要
9981689SinclairThis award supports the participation of American scientists in a U.S.-Japan seminar on Contribution of In Situ Electron Microscopy to Understanding and Creation of Advanced Materials, to be held in Kyoto, Japan, from November 7-10, 2000. The co-organizers are Professors Robert Sinclair at Stanford University and Professor Hiroyasu Saka at Nagoya University in Japan. The majority of in situ TEM (transmission electron microscopy) is carried out in the U.S. and in Japan. The former has strengths in materials science applications (e.g. thin film deposition, semiconductor defect behavior, and catalysis), whereas the latter has a wider variety of hardware (e.g. higher voltage microscopes, higher temperature specimen holder, and piezo-electric devices). Currently there is very little basis for the exchange of ideas, experiments or personnel. This seminar will include presentations of the most recent developments in the field. In addition, the strengths of the two countries' approaches will be highlighted. A significant portion of time will then be allocated to developing the field in the future and assuming definitive collaborations.Many high technology materials these days are made from the atomic level up (e.g. microelectronic, computer hard disks, nanomaterials). Understanding and improving their performance requires examination at extremely high levels of magnification and resolution, which is provided by transmission electron microscopy. This method is being applied in an increasing number of ways and in a more innovative fashion. Seminar organizers have made a special effort to involve younger researchers as both participants and observers. The exchange of ideas and data with Japanese experts in this field will enable U.S. participants to advance their own work, and will set the stage for future collaborative projects. Dissemination plans for the seminar proceedings include publication in the "Journal of Electron Microscopy." A summary of the symposium should also be available in "Materials Research Society Bulletin," and "Microscopy Society of America Bulletin."
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专著(0)
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会议论文
U.S.-France Cooperative Research: Preparation and Characterization of Thin Films on Substrates
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批准号:9216905
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项目类别:Standard Grant
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资助金额:$1.36万
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财政年份:1993
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负责人:Robert Sinclair
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依托单位:
Dynamic Studies of Reactions at Semiconductor Interfaces
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批准号:8902232
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项目类别:Continuing Grant
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资助金额:$43.38万
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财政年份:1990
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负责人:Robert Sinclair
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依托单位:
US-France Cooperative Research: Structure and Properties ofCrystalline-Amorphous Composite Coatings on Stainless Steel
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批准号:8815495
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项目类别:Standard Grant
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资助金额:$1.02万
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财政年份:1989
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负责人:Robert Sinclair
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依托单位:
U.S.-France Cooperative Research: Microstructure and Surface Properties of Amorphous Nickel-Titanium Alloys
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批准号:8414029
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项目类别:Standard Grant
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资助金额:$1.05万
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财政年份:1985
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负责人:Robert Sinclair
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依托单位:
Acquisition of Equipment Grant: High Resolution Transmission Electron Microscopy Facility
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批准号:7721629
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项目类别:Standard Grant
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资助金额:$20.2万
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财政年份:1977
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负责人:Robert Sinclair
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依托单位:
Travel to Attend: 3rd Latin American Congress on Electron Microscopy, Santiago, Chile, 11/22-26/76
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批准号:7700443
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项目类别:Standard Grant
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资助金额:$0.09万
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财政年份:1976
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负责人:Robert Sinclair
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依托单位:
海外基金