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SBIR Phase II: Planar Magnetic Levitation Technology for Precision Microelectronics Manufacturing Equipment

SBIR Phase II: Planar Magnetic Levitation Technology for Precision Microelectronics Manufacturing Equipment
SBIR第二期:精密微电子制造设备平面磁悬浮技术
批准号:
0078419
负责人:
Edward Lovelace
金额:
$39.78万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2001
资助国家:
美国
项目状态:
已结题
起止时间:
2001-02-01 至 2003-01-31

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中文摘要
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英文摘要
This Small Business Innovation Research (SBIR) Phase II project will develop a planar magnetic levitator/positioner for precision microelectronics manufacturing equipment. Based on feasibility proven in Phase I, Phase II will design, construct, and test a minimum-actuator maglev stage that can be readily integrated in a process tool. A single-moving maglev platen will be driven in all six degrees of freedom with three levitation motors. The platen will generate large two-dimensional motions for transportation with small four-axis motions for alignment and small adjustments. It will lead to a clean-room compatible, lightweight, compact, inexpensive structure that can meet demanding dynamic performance requirements in next-generation precision microelectronics manufacturing.Magnetic levitation has many potential applications in microelectronics manufacturing equipment that require precise planar position control, such as wafer steppers, wafer handlers, wire bonders, surface profilometers, scanned probe microscopes, and precision inspection machines. This technology is expected to figure prominently in the highly competitive microelectronics manufacturing capital equipment industry.
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