SBIR Phase II: Planar Magnetic Levitation Technology for Precision Microelectronics Manufacturing Equipment

SBIR第二期：精密微电子制造设备平面磁悬浮技术

• 批准号: 0078419
• 负责人: Edward Lovelace
• 金额: $ 39.78万
• 依托单位: SATCON TECHNOLOGY CORPORATION
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2001
• 资助国家: 美国
• 起止时间: 2001-02-01 至 2003-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0078419&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Planar; Magnetic

This Small Business Innovation Research (SBIR) Phase II project will develop a planar magnetic levitator/positioner for precision microelectronics manufacturing equipment. Based on feasibility proven in Phase I, Phase II will design, construct, and test a minimum-actuator maglev stage that can be readily integrated in a process tool. A single-moving maglev platen will be driven in all six degrees of freedom with three levitation motors. The platen will generate large two-dimensional motions for transportation with small four-axis motions for alignment and small adjustments. It will lead to a clean-room compatible, lightweight, compact, inexpensive structure that can meet demanding dynamic performance requirements in next-generation precision microelectronics manufacturing.Magnetic levitation has many potential applications in microelectronics manufacturing equipment that require precise planar position control, such as wafer steppers, wafer handlers, wire bonders, surface profilometers, scanned probe microscopes, and precision inspection machines. This technology is expected to figure prominently in the highly competitive microelectronics manufacturing capital equipment industry.

这个小企业创新研究（SBIR）二期项目将开发用于精密微电子制造设备的平面磁悬浮/定位器。基于第一阶段验证的可行性，第二阶段将设计、建造和测试一个可以很容易集成到工艺工具中的最小致动器磁悬浮阶段。单个移动的磁悬浮平台将由三个悬浮电机驱动，实现所有六个自由度。压板将产生大的二维运动用于运输，小的四轴运动用于校准和小的调整。它将导致洁净室兼容，轻量，紧凑，廉价的结构，可以满足苛刻的动态性能要求，在下一代精密微电子制造。磁悬浮在微电子制造设备中有许多潜在的应用，这些设备需要精确的平面位置控制，如晶圆步进器，晶圆处理机，焊丝机，表面轮廓仪，扫描探针显微镜和精密检测机。这项技术有望在竞争激烈的微电子制造资本设备行业中占据突出地位。