CAREER: Fundamental Aspects of Electrocrystallization Phenomena: An Experimental and Modeling Approach
CAREER: Fundamental Aspects of Electrocrystallization Phenomena: An Experimental and Modeling Approach
批准号:
0093154
负责人:
Giovanni Zangari
金额:
$40.42万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2001
资助国家:
美国
项目状态:
已结题
起止时间:
2001-05-01 至 2002-12-31
中文摘要
0093154 Zangari电化学沉积(ECD)中的过程控制是一项具有挑战性的任务。一个基本的理解,在薄膜形成过程中所涉及的是需要开发一个预测性的,定量的模型,薄膜微观结构上的沉积变量的影响。在这个职业生涯授予一组代表性的电沉积系统的成核和生长过程进行了全面的调查,目的是开发这样一个模型,从而提供更好的工具,ECD制造的金属薄膜。电化学技术,产生空间平均的生长过程中的信息,和显微镜/结构的方法,提供在微观尺度上的形态学数据,耦合产生一个全面的描述模型系统的电结晶行为。这两种技术通过原位和真实的时间监测金属的电响应以及成核和生长过程而独特地结合到通过光刻方法制造的微电极和纳米电极中。实验的努力是集成的成核和生长过程的动力学Monte Carlo模拟,以量化的金属类型,电解质化学和沉积变量对所得薄膜的微观结构的影响。 实验结果被用来验证和改进的数值模拟,并利用由此产生的模型来开发一个定量描述电解质溶液中的电结晶现象。ECD的理论、研究和实践将被整合到亚拉巴马大学的本科和研究生材料工程课程中,目的是提高学生在ECD技术和应用领域的技能和创造性思维。本科阶段的学生将接触到该领域的实验室项目。将关注少数族裔以及经济和社会风险学生的招募和保留。研究生将有机会参加关于ECD理论和实践的高度跨学科课程,其中讲座将通过实验室会议和模拟工具进行补充。利用这些工具开发的多媒体模块将用于讲座,并通过网络出版向公众提供。ECD技术广泛用于厚涂层的制造和通过光刻图案的沉积。ECD工艺具有监测和控制涂层成核和生长的独特能力。 这使得ECD成为合成微电子、磁记录和MEMS应用的高性能金属涂层的理想选择,在这些应用中,在宽范围的长度尺度上控制微结构和织构是必不可少的。
英文摘要
0093154ZangariProcess control in electrochemical deposition (ECD) is a challenging task. A fundamental understanding of the processes involved in film formation is needed to develop a predictive, quantitative model for the effects of deposition variables on film microstructure. In this CAREER grant a comprehensive investigation of nucleation and growth processes of a representative set of electrodeposition systems is undertaken with the objective to develop such a model and thus provide better tools for ECD fabrication of metallic films. Electrochemical techniques, which yield spatially averaged information on the growth process, and microscopy/structural methods, that provide morphological data at the microscopic scale, are coupled to yield a comprehensive description of the electrocrystallization behavior of the model systems. These two techniques are uniquely combined by monitoring in-situ and in real time the electrical response and nucleation and growth processes of metals into micro- and nano-electrodes fabricated by lithographic methods. The experimental effort is integrated with a kinetic Monte Carlo simulation of the nucleation and growth process to quantify the effects of metal type, electrolyte chemistry, and deposition variables on the microstructure of the resulting films. The experimental results are used to validate and improve the numerical simulations, and the resulting models are utilized to develop a quantitative description of electrocrystallization phenomena in electrolytic solutions. The theory, research and practice of ECD will be integrated into the undergraduate and graduate materials engineering curricula at the University of Alabama with the objective of enhancing skills and creative thinking of students in the area of ECD technology and applications. Students at the undergraduate level will be exposed to laboratory projects in this field. Attention will be devoted to recruitment and retention of minorities as well as economically and socially at risk students. Graduate students will have the opportunity to attend a highly interdisciplinary course on the theory and practice of ECD, wherein the lectures will be complemented by laboratory sessions and simulation tools. Multimedia modules developed using these tools will be employed in lectures and made available to the general public through web publishing. %%%ECD techniques are widely employed for fabrication of thick coatings and for deposition through lithographic patterns. ECD processes have unique capabilities to monitor and control the nucleation and growth of coatings. This makes ECD ideal for the synthesis of high performance metallic coatings for microelectronics, magnetic recording, and MEMS applications, where control of microstructure and texture over a wide range of length scales is essential.***
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批准号:1030858
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项目类别:Standard Grant
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资助金额:$35.0万
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财政年份:2010
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负责人:Giovanni Zangari
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财政年份:2007
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资助金额:$29.8万
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财政年份:2003
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负责人:Giovanni Zangari
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依托单位:
CAREER: Fundamental Aspects of Electrocrystallization Phenomena: An Experimental and Modeling Approach
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批准号:0314233
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项目类别:Continuing Grant
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资助金额:$38.61万
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财政年份:2002
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负责人:Giovanni Zangari
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依托单位:
海外基金