NER: Nanoparticle Deposition and Implantation: Exploratory Research into a New Method for Making and Modifying Thin Films

0103118 myrick1 .该提案是在“纳米尺度科学与工程”（NSF 00-119）招标中收到的。本项目将探索一种新的薄膜形成和注入技术，适用于聚合物和低蒸汽压有机材料的真空加工。这种方法使用加速纳米粒子从通常需要非真空处理（如自旋铸造）的材料中生成薄膜，因此与大多数集成电路/半导体处理方法不兼容。纳米粒子将通过粒子束界面注入真空室，该界面采用超音速自由射流膨胀和电子冲击电离系统对粒子进行充电和加速。我们将探索该界面是否可以用于沉积具有足够动能的纳米颗粒，以在撞击时瞬间熔化材料。人们希望纳米颗粒的使用可以使材料的能量密度保持在微粒的主要化学性质发生不可逆改变的临界点以下。通过沉降和加速沉积在表面上的纳米颗粒将通过表面光谱、探针显微镜和温度编程解吸质谱进行研究。这些研究将告诉我们沉积材料的性质，纳米颗粒是否因沉积/熔化而受损，以及沉积物的形态。分子动力学模拟将进行，以发展的理解，可能导致沉积的控制。这些模拟将基于分子动力学模拟的经典方法，通过混合复杂的多体势和简单的成对势。＊＊＊

0103118MyrickThis proposal was received in response to the solicitation "Nanoscale Science and Engineering" (NSF 00-119).This project will explore a novel technique for film formation and implantation that is applicable to vacuum processing of polymers and low-vapor-pressure organic materials. This approach uses accelerated nanoparticles to create films from materials that ordinarily require non-vacuum processing (such as spin-casting) and are thus incompatible with most integrated circuit/semiconductor processing methods. Nanoparticles will be injected into a vacuum chamber by a particle beam interface that employs a supersonic free jet expansion and an electron impact ionization system to charge and accelerate the particles. We will explore whether this interface can be used to deposit nanoparticles with sufficient kinetic energy to instanteously melt the materials on impact. It is hoped that the use of nanoparticles may keep the energy density of the material below the point at which the primary chemical nature of the particle is irreversibly altered. Nanoparticles deposited by settling and acceleration onto surfaces will be studied with surface spectroscopies, probe microscopy and temperature-programmed desorption mass spectroscopy. These studies will inform us about the nature of the materials deposited, whether the nanoparticles have been damaged by deposition/melting, and about the morphologies of the deposits. Molecular dynamics simulations will be performed to develop understanding that may lead to control of deposition. These simulations will be based on the classical method of molecular dynamics simulations by mixing sophisticated many-body potentials with simple pairwise potentials. ***