NER: Nanoparticle Deposition and Implantation: Exploratory Research into a New Method for Making and Modifying Thin Films

0103118这项建议是应“纳米科学与工程”(NSF 00-119)的邀请而收到的。该项目将探索一种新的薄膜形成和注入技术，适用于聚合物和低蒸汽压有机材料的真空加工。这种方法使用加速的纳米颗粒，从通常需要非真空加工(如旋转浇注)的材料制造薄膜，因此与大多数集成电路/半导体加工方法不兼容。纳米粒子将通过采用超音速自由喷射膨胀和电子碰撞电离系统的粒子束界面注入真空室，以对粒子进行充电和加速。我们将探索这种界面是否可以用来沉积具有足够动能的纳米颗粒，以在撞击时瞬间熔化材料。人们希望，纳米粒子的使用可以将材料的能量密度保持在粒子的主要化学性质不可逆转地改变的点以下。通过表面光谱分析、探针显微镜和程序升温脱附质谱学对沉积在表面的纳米颗粒进行研究。这些研究将让我们了解沉积材料的性质，纳米颗粒是否被沉积/熔化破坏，以及沉积的形貌。将进行分子动力学模拟，以加深对可能导致沉积控制的理解。这些模拟将基于分子动力学模拟的经典方法，通过混合复杂的多体势和简单的成对势来进行。***

0103118MyrickThis proposal was received in response to the solicitation "Nanoscale Science and Engineering" (NSF 00-119).This project will explore a novel technique for film formation and implantation that is applicable to vacuum processing of polymers and low-vapor-pressure organic materials. This approach uses accelerated nanoparticles to create films from materials that ordinarily require non-vacuum processing (such as spin-casting) and are thus incompatible with most integrated circuit/semiconductor processing methods. Nanoparticles will be injected into a vacuum chamber by a particle beam interface that employs a supersonic free jet expansion and an electron impact ionization system to charge and accelerate the particles. We will explore whether this interface can be used to deposit nanoparticles with sufficient kinetic energy to instanteously melt the materials on impact. It is hoped that the use of nanoparticles may keep the energy density of the material below the point at which the primary chemical nature of the particle is irreversibly altered. Nanoparticles deposited by settling and acceleration onto surfaces will be studied with surface spectroscopies, probe microscopy and temperature-programmed desorption mass spectroscopy. These studies will inform us about the nature of the materials deposited, whether the nanoparticles have been damaged by deposition/melting, and about the morphologies of the deposits. Molecular dynamics simulations will be performed to develop understanding that may lead to control of deposition. These simulations will be based on the classical method of molecular dynamics simulations by mixing sophisticated many-body potentials with simple pairwise potentials. ***