NER: Nanoparticle Deposition and Implantation: Exploratory Research into a New Method for Making and Modifying Thin Films

0103118 Myrick本项目是应“纳米科学与工程”（NSF 00-119）征集而收到的。本项目将探索一种适用于聚合物和低蒸气压有机材料真空处理的膜形成和注入的新技术。 这种方法使用加速的纳米颗粒来从通常需要非真空处理（例如旋转浇铸）的材料产生膜，因此与大多数集成电路/半导体处理方法不兼容。 纳米粒子将通过粒子束接口注入真空室中，该粒子束接口采用超音速自由射流膨胀和电子碰撞电离系统来对粒子进行充电和加速。 我们将探讨这个界面是否可以用来存款纳米粒子与足够的动能瞬间熔化的材料的影响。 人们希望使用纳米颗粒可以将材料的能量密度保持在低于颗粒的主要化学性质不可逆地改变的点。沉积在表面上的沉淀和加速的纳米粒子将与表面光谱，探针显微镜和程序升温解吸质谱研究。 这些研究将告诉我们沉积材料的性质，纳米颗粒是否已被沉积/熔化损坏，以及沉积物的形态。 将进行分子动力学模拟，以发展可能导致控制沉积的理解。 这些模拟将基于分子动力学模拟的经典方法，通过将复杂的多体势与简单的成对势混合。***

0103118MyrickThis proposal was received in response to the solicitation "Nanoscale Science and Engineering" (NSF 00-119).This project will explore a novel technique for film formation and implantation that is applicable to vacuum processing of polymers and low-vapor-pressure organic materials. This approach uses accelerated nanoparticles to create films from materials that ordinarily require non-vacuum processing (such as spin-casting) and are thus incompatible with most integrated circuit/semiconductor processing methods. Nanoparticles will be injected into a vacuum chamber by a particle beam interface that employs a supersonic free jet expansion and an electron impact ionization system to charge and accelerate the particles. We will explore whether this interface can be used to deposit nanoparticles with sufficient kinetic energy to instanteously melt the materials on impact. It is hoped that the use of nanoparticles may keep the energy density of the material below the point at which the primary chemical nature of the particle is irreversibly altered. Nanoparticles deposited by settling and acceleration onto surfaces will be studied with surface spectroscopies, probe microscopy and temperature-programmed desorption mass spectroscopy. These studies will inform us about the nature of the materials deposited, whether the nanoparticles have been damaged by deposition/melting, and about the morphologies of the deposits. Molecular dynamics simulations will be performed to develop understanding that may lead to control of deposition. These simulations will be based on the classical method of molecular dynamics simulations by mixing sophisticated many-body potentials with simple pairwise potentials. ***