Selective Chemical Liquid Deposition Process for Mini-Structures and Microsystems

这个为期一年的项目的目的是证明一种新的选择性化学液体沉积工艺（SCLD）的可行性，该工艺可以创建比其他沉积和固体自由成形制造工艺具有更好性能和更低制造引起的残余应力的3D结构。 目前，用于制造微结构和MEMS的大多数技术涉及复杂且昂贵的工艺，例如光刻、硅表面加工和硅体加工。 例如，化学气相沉积处理是中高温沉积工艺，其将缺陷和残余应力引入到所产生的膜中。 为了克服CVD的缺点，并探索新的化学沉积应用和新材料在微型结构和微系统的制造中，SCLD工艺将在一个自动化过程中集成化学液体沉积研究，固体自由成形制造，系统和控制以及微型结构和微系统（MSMS）。 开发SCLDP-MSMS的研究计划研究了受控沉积，因为室温溶液或液体反应物从喷嘴喷射，与热衬底接触，导致蒸发，分解或反应。 通过控制喷嘴的运动和喷射时间，可以实现逐层扫描技术，使反应后的固体产物在基体上形成存款，并在SCLDP-MSMS系统的概念设计、材料选择和测试方面做了初步工作。 结果令人鼓舞。 为了将这一新概念变为现实，将开展以下工作：（1）对化学液相沉积工艺进行广泛的材料研究和试验，以找到更多可用于存款金属、陶瓷、硅、复合材料和碳结构的化学品;（2）设计和建造一台SCLDP-MSMS样机，并使用样机制作微结构;以及（3）在SCLDP上执行附加实验，以提供用于过程建模和计算机模拟的必要数据、边界条件和分析信息。

The objective of this one year project is to demonstrate the feasibility of a novel Selective Chemical Liquid Deposition process (SCLD) that creates 3-D structures with better properties and lower fabrication-induced residual stresses than other deposition and solid freeform fabrication processes. Currently most of the technologies used in fabrication of microstructures and MEMS involve sophisticated and expensive processes, such as photo-lithography, silicon surface machining, and silicon bulk machining. For example, chemical vapor deposition processing is a moderate to high temperature deposition process that introduces defects and residual stresses into the films produced. To overcome CVD shortcomings and to explore new chemical deposition applications and new materials in the fabrication of mini-structures and microsystems, the SCLD Process will integrate chemical liquid deposition research, solid freeform fabrication, systems and control, and mini-structures and microsystems (MSMS) in one automated process. The research plan for developing SCLDP-MSMS investigates the controlled deposition as a room temperature solution or liquid reactant is sprayed from a nozzle, making contact with a hot substrate, resulting in evaporation, decomposition, or reaction. It is expected that the reacted solid products will deposit on the substrate and that by controlling the motion of the nozzle and the spray time, a desired 3-D microstructure can be formed through a layer-by-layer scanning technique.Preliminary work has been done on the conceptual design of the SCLDP-MSMS system, materials selection, and testing. The results are promising. In order to turn this new concept into a reality, the following tasks will be carried out: (1) conduct extensive materials research and testing on the chemical liquid deposition process to find more chemicals which can be used to deposit metals, ceramics, silicon, composite, and carbon structures; (2) design and build a prototype SCLDP-MSMS machine and use the prototype machine to make microstructures; and (3) perform additional experiments on the SCLDP to provide necessary data, boundary conditions and analysis information for process modeling and computer simulation.