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Silicon Run Implantation Video

Silicon Run Implantation Video
Silicon Run 植入视频
批准号:
0123300
负责人:
Ruth Carranza
金额:
$10.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2002
资助国家:
美国
项目状态:
已结题
起止时间:
2002-04-15 至 2005-03-31

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中文摘要
翻译
Silicon Run系列包括有关半导体制造的专题视频。这种格式,包括概述和具体过程的视频,已被证明是宝贵的教师谁往往必须教课程的学生在不同的技术理解水平。硅跑系列目前包括以下视频:介绍:概述硅跑Lite 30分钟。中级:概述硅运行I -第二版40分钟。Silicon Run II 35分钟。先进:工艺特定:硅运行沉积31分钟。硅运行光刻31分钟。Silicon Run蚀刻37分钟硅离子注入(待制作)硅离子注入的目标是用一个30分钟的视频制作来完成该系列,该视频展示了将杂质(称为掺杂剂)引入硅片以改变特定区域导电性的过程。与本系列的其余部分一样,本视频是为本科电气工程和工程技术课程以及行业半导体技术人员培训计划设计的。使用该系列来补充其课程的教育工作者特别要求制作最后一个视频,以确保他们对所有四种半导体工艺有深入的报道。对他们来说,视频为学生提供了他们自己无法提供的东西;一个IC制造工厂内部的特写镜头。由于洁净室程序和竞争问题,行业的限制性政策使公众甚至内部员工无法进入生产现场。这种不可访问性已被证明是一个教育挑战,硅跑系列通过其视频解决了这一问题。制作高质量的教育视频是用来直观地记录最先进的离子注入,并使其与半导体教育和技术人员培训计划相关的方法。这需要教授和行业培训师的参与,以确保内容的准确性;企业赞助商提供资金和进入工业现场的机会;媒体艺术家以专业的视频格式捕捉这一过程,并将其编辑成引人入胜的故事情节。动画,显微拍摄和特殊效果被用来加强理解。离子注入的生产将完成硅运行系列,因此它可以作为这些程序的教育工具,提供一个现实的看半导体制造。
英文摘要
The Silicon Run Series consists of topical videos on semiconductor manufacturing. This format, which includes overviews as well as process specific videos, has proven invaluable to instructors who often must teach courses to students at different levels of technical understanding. The Silicon Run series currently consists of the following videos:Introductory: Overview Silicon Run Lite 30 min.Intermediate: Overview Silicon Run I - 2nd Edition 40 min.Silicon Run II 35 min.Advanced: Process-Specific: Silicon Run Deposition 31 min.Silicon Run Lithography 31 min.Silicon Run Etch 37 min.Silicon Run Ion Implantation (to be produced)The objective of Silicon Run Ion Implantation is to complete the Series with a 30 minute video production featuring the process whereby impurities, known as dopants, are introduced into silicon wafers to alter the electrical conductivity of specific regions. As with the rest of the Series, this video is designed for undergraduate electrical engineering and engineering technology courses and for industry's semiconductor technician training programs. Educators who use the Series to supplement their courses are specifically requesting the production of this last video to ensure they have in-depth coverage of all four semiconductor processes. To them, the videos provide their students what they themselves can not; an intimate close-up view inside an IC fabrication facility. Industry's restrictive policies, due to clean room procedures and competitive issues, make manufacturing sites unavailable to the public and even to in-house employees. This inaccessibility has proven an educational challenge which the Silicon Run Series has addressed through its videos. The production of quality educational videos is the method being employed to visually document state-of-the-art ion implantation and make it relevant to semiconductor education and technician training programs. This requires the participation of professors and industrial trainers to ensure content accuracy; corporate sponsors to provide funding and access to industrial locations: and media artists to capture the process in a professional video format that can be edit into an engaging storyline. Animation, microscopic filming, and special effects are used to enhance understanding. The production of Ion Implantation will complete the Silicon Run Series so it can serve these programs as an educational tool that provides a realistic look at semiconductor manufacturing.
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Pre-Production for Silicon Run Nanoelectronics Video
  • 批准号:
    1551497
  • 项目类别:
    Standard Grant
  • 资助金额:
    $7.5万
  • 财政年份:
    2015
  • 负责人:
    Ruth Carranza
  • 依托单位:
MEMS, Nanotechnology, and the Silicon Run Series
  • 批准号:
    0907838
  • 项目类别:
    Standard Grant
  • 资助金额:
    $64.98万
  • 财政年份:
    2008
  • 负责人:
    Ruth Carranza
  • 依托单位:
MEMS, Nanotechnology, and the Silicon Run Series
  • 批准号:
    0703002
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2007
  • 负责人:
    Ruth Carranza
  • 依托单位:
MEMS, Nanotechnology and the Silicon Run Series
  • 批准号:
    0501571
  • 项目类别:
    Standard Grant
  • 资助金额:
    $10.0万
  • 财政年份:
    2005
  • 负责人:
    Ruth Carranza
  • 依托单位:
国内基金
海外基金
面向汽车物流Milk-run的装箱与车辆路径问题集成研究
  • 批准号:
    71371162
  • 项目类别:
    面上项目
  • 资助金额:
    52.0万元
  • 批准年份:
    2013
  • 负责人:
    伊俊敏
  • 依托单位:
线粒体新型融合方式“kiss-and-run”的分子机制与功能研究