SBIR Phase I: Very-Large-Area Lithography System for Flexible Displays and Fluidic-Self-Assembly-Based Electronics

该小型企业创新研究（SBIR）第一阶段项目致力于超大面积柔性显示器的制造。开发一种低成本的制造工艺，使超大面积的柔性显示器能够为军方和消费者制造，这一点至关重要。超大面积光刻和流体自组装领域的最新技术创新为低成本大批量柔性显示器制造提供了独特的工艺。安维克公司开发了一种突破性的光刻技术，能够在柔性基板上高产量、高成本效益地生产超大型显示器（对角线20至120英寸），这些显示器可以作为离散片材装载，也可以以卷对卷配置连续进料。Anvil的超大面积光刻技术代表了显示器制造领域的重大突破。在本论文中，我们提出了一个可生产的光刻系统的开发计划，该系统可用于高通量、低成本地制造尺寸可达60英寸对角线的柔性、高分辨率显示器，该光刻工艺与流体自组装制造技术兼容，将潜在地导致更高的性能和更低的成本。

This Small Business Innovation Research (SBIR) Phase I project addresses the manufacturing of very-large-area flexible displays. It is critical to develop a low-cost manufacturing process that enables very-large-area flexible displays to be manufactured for the military as well as the consumer. Recent technical innovations in the area of very-large-area lithography and fluidic self-assembly offer a unique process for low-cost high-volume flexible display manufacturing. Anvik Corporation has developed a breakthrough lithography technology that enables high-throughput, cost-effective production of very large displays (20 to 120 inches diagonal) on flexible substrates, which may be either loaded as discrete sheets or fed continuously in a roll-to-roll configuration. Anvil's very-large-area lithography technology represents a significant breakthrough in display manufacturing. In this proposal, we present a program for developing a production-worthy lithography system for high-throughput, low-cost fabrication of flexible, high-resolution displays of sizes up to 60-inch diagonal.This lithography process are that it is compatible with fluidic self-assembly manufacturing techniques will potentially result in higher performance and lower cost displays.