SBIR Phase I: Optimized Microvia Generation Technology for Low-Cost Manufacturing of Electronic Modules
SBIR Phase I: Optimized Microvia Generation Technology for Low-Cost Manufacturing of Electronic Modules
批准号:
0214695
负责人:
Marc Klosner
金额:
$10.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2002
资助国家:
美国
项目状态:
已结题
起止时间:
2002-07-01 至 2002-12-31
中文摘要
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英文摘要
This Small Business Innovation Research (SBIR) Phase I project addresses the requirement of high-density microvias, which are critical in a variety of microelectronic modules, such as Flat-Panel Displays (FPDs), Multi-Chip Modules (MCMs), and Printed Circuit Boards (PCBs). As these modules become ever faster, more compact, and more capable, their density of interconnects has been increasing dramatically and new packaging technologies such as Chip-Scale Packages (CSPs) and Ball-Grid Arrays (BGAs) have been developed to accommodate all the required input and output (I/Os) connections. Such dense interconnects are realized by the generation of hundreds of thousands of microvias in the substrate layers on which the electronic modules are built. These microvias are also both difficult and expensive to produce because of their small sizes and large numbers. Current technologies for microvia generation are not optimized for the varied cost considerations of different manufacturing requirements direct-write tools address low-volume needs, whereas mask projection systems are designed for very high via-density products. The system technology described in this proposal offers several desirable features, including: high-speed microvia generation for different via densities, full microvia pattern programmability, capability to drill high-threshold photo-ablation substrates, and full and efficient utilization of available high-power excimer lasers.A variety of microelectronic modules, such as flat panel displays, multi-chip modules, and printed circuit boards play an important role in numerous advanced technology applications in both commercial and military systems. Results from this project could result in substantial cost reductions in a wide range of electronic modules.
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SBIR Phase I: Versatile Maskless Patterning Technology For Cost-Effective Fabrication of Microelectronic Packaging Products
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批准号:0512241
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:2005
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负责人:Marc Klosner
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依托单位:
SBIR Phase I: Very-Large-Area Lithography System for Flexible Displays and Fluidic-Self-Assembly-Based Electronics
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批准号:0214745
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项目类别:Standard Grant
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资助金额:$10.0万
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财政年份:2002
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负责人:Marc Klosner
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依托单位:
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