Establishing an I/UCRC Center Site for Microcontamination Control at Northeastern University

东北大学的工业/大学合作研究中心研究站点将与行业成员以及亚利桑那大学和伦斯勒理工学院现有的微污染控制中心合作，开发解决方案，以提高行业产量并增强其竞争力。所有三个地点的工业成员将分享所有地点的研究成果。研究重点包括表面清洁和准备的基本原理、颗粒附着和去除机制、通过稀释化学反应、低温气雾剂和超临界流体(如超临界二氧化碳)减少化学品的使用，以及通过提高清洁效率减少用水量。气体中的污染物也将通过粒子产生、传输、沉积的物理模拟来解决，这些粒子在薄膜工艺中导致污染。该中心还将致力于开发微型传感器，可用于在半导体和其他工艺中原位检测超纯气体中的杂质。

The Industry/University Cooperative Research Center research site at Northeastern University will work jointly with the industrial members and the existing Microcontamination Control center at the University of Arizona and Rensselaer Polytechnic Institute to develop solutions that will improve the industry's yield and contribute to their competitiveness. The industrial members at all three sites will share the research results of all the sites.The research focuses on the fundamentals of surface cleaning and preparation, particle adhesion and removal mechanisms, reduction of the use of chemicals through dilute chemistries, cryogenic aerosols and supercritical fluids (such as supercritical CO2) and reduction of water use through increased cleaning efficiency. Contamininants in gases will also be addressed through physical modeling of particle generation, transport, deposition resulting in contamination in thin film process. The center will also work toward the development of micro-sensors that can be used to detect impurities insitu in ultra pure gases used in semiconductor and other processes.