SBIR Phase I: Microscale Interferometric Sensor for High Speed MEMS Metrology

该SBIR第一阶段项目研究了创新的微机械光学干涉仪作为MEMS生产质量控制工具的科学和技术可行性。MEMS作为一种使能技术和一个新市场的增长障碍之一是质量控制。质量控制不仅提供质量保证，而且还提供反馈，以优化设计，制造和组装过程。所提出的具有静电致动光栅的微尺度位置传感光栅干涉仪（uPSGI）本身是微加工的并且与光电子集成。它测量MEMS的位移，具有高分辨率（亚纳米）和带宽（MHz）。在这个项目中，一个uPSGI与可移动光栅将被制造和集成到显微镜物镜。将在动态MEMS器件上测试干涉仪的性能，并评估并行阵列操作的可行性。所提出的技术将大规模干涉测量系统转换为使用专利技术的微型传感器。它可以根据MEMS制造商的特定需求量身定制，以降低制造成本、交货时间和材料浪费，并提高产品可靠性。潜在客户包括所有MEMS制造公司。

This SBIR Phase I project investigate the scientific and technical feasibility of an innovative micromachined optical interferometer as a quality control tool for MEMS production. One of the barriers to the growth of MEMS both as an enabling technology and as a new market is quality control. Quality control not only provides quality assurance but also it provides feedback to optimize the design, fabrication and assembly processes involved. The proposed microscale position sensing grating interferometer (uPSGI) with electrostatically actuated grating is itself microfabricated and integrated with optoelectronics. It measures the displacement of MEMS with high resolution (sub-nm) and bandwidth ( MHz). In this project, a uPSGI with movable grating will be fabricated and integrated into a microscope objective. The performance of the interferometric will be tested on dynamic MEMS devices and the feasibility of parallel array operation will be evaluated. The proposed technology converts the large-scale interferometric metrology system to a miniature sensor using a patented technology. It can be tailored for specific needs of MEMS manufacturers to reduce manufacturing costs, lead-time and waste of material and to increase product reliability. Potential customers include all the MEMS manufacturing companies.