MRI: Acquisition of a Deep Silicon Etch Tool for NEMS/MEMS Fabrication

MRI：购买用于 NEMS/MEMS 制造的深硅蚀刻工具

• 批准号: 0320659
• 负责人: Svetlana Tatic-Lucic
• 金额: --
• 依托单位: Lehigh University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-09-01 至 2008-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0320659&HistoricalAwards=false
• 关键词: MRI; Acquisition; Deep; Silicon; Etch

This MRI Proposal involves procurement of an STS Multiplex System for Standard Rate Advanced Silicon Etch (ASE-SR). Difficult processes that are routinely addressed using this equipment include: deep- and through-wafer etching of silicon, high aspect ratio feature etching, membrane release etching, and silicon on insulator (SOI) applications. In the microelectromechanical systems (MEMS) arena, the STS etcher provides the unique capability to achieve unconstrained geometry of the devices. This very significantly increases the options available to the device designer. In addition, in MEMS packaging activities (which have undoubtedly the most profound impact on the manufacturability and the future of the MEMS field in general), it offers additional opportunities such as achieving high-density through-wafer interconnects, as well as a plethora of new options for MEMS encapsulation.This piece of equipment can be used for the fabrication of extremely precise mechanical masks (i.e., shadow masks) for metal evaporation, which in turn can be used to anchor nanodevices such as carbon nanotubes in the desired position on a substrate. Also, this equipment can be modified to do conventional reactive ion etching (RIE), which would be very useful for researchers is the field of general microelectronics.Specific projects under way or planned for the near future include fabrication of sophisticated microactuators used to study effects of dynamic loading on bone cell behavior, miniature chemical synthesis microplants for the delivery of H2 to micro-fuel cells, and micro- and nano-tensile test specimens with high dimensional accuracy.Broader ImpactsAt Lehigh University, there is currently a huge new set of thrusts in the fields of MEMS, bioengineering and nanotechnology. Educational programs at the undergraduate level are being developed to match the research growth in these areas. It is the plan that new laboratory courses will be offered in the MEMS field (both in the Electrical and Computer Engineering Department, as well as the newly emerging Bioengineering undergraduate track in which the PI and co-PI's are participants), for which this piece of equipment would be indispensable. Also, it will serve the surrounding community within the Lehigh Valley, particularly the local colleges and K-12 students by providing a vehicle for the fabrication of interesting microdevices for visually attractive It "show and tell" demonstrations. A special effort will be made to introduce students on all educational levels into the magical worlds of micro- and nanotechnology.

该MRI提案涉及采购用于标准速率高级硅蚀刻（ASE-SR）的STS多路复用系统。通常使用该设备解决的困难工艺包括：硅的深晶片和通晶片蚀刻，高纵横比特征蚀刻，膜释放蚀刻和绝缘体上硅（SOI）应用。在微机电系统（MEMS）领域，STS蚀刻机提供了独特的能力来实现器件的无约束几何形状。这极大地增加了设备设计人员可用的选项。此外，在MEMS封装活动中（这无疑对一般MEMS领域的可制造性和未来产生了最深远的影响），它提供了额外的机会，例如实现高密度的通晶圆互连，以及MEMS封装的大量新选择。这种设备可用于制造用于金属蒸发的极其精确的机械掩膜（即阴影掩膜），从而可用于将碳纳米管等纳米器件固定在基板上所需的位置。此外，该设备还可以进行常规的反应离子蚀刻（RIE），这将对通用微电子领域的研究人员非常有用。正在进行或计划在不久的将来进行的具体项目包括制造用于研究动态载荷对骨细胞行为影响的复杂微致动器，用于向微型燃料电池输送H2的微型化学合成微植物，以及具有高尺寸精度的微和纳米拉伸试样。更广泛的影响在里海大学，目前在微机电系统、生物工程和纳米技术领域有一系列巨大的新进展。本科阶段的教育项目正在发展，以配合这些领域的研究增长。计划将在MEMS领域开设新的实验课程（包括电气和计算机工程系，以及新出现的生物工程本科课程，PI和副PI都是参与者），这台设备将是不可或缺的。此外，它还将服务于利哈伊山谷周围的社区，特别是当地的大学和K-12学生，为制作有趣的微型设备提供交通工具，进行视觉上有吸引力的“展示和讲述”演示。将作出特别努力，向各教育层次的学生介绍微观和纳米技术的神奇世界。