Workshop: Fundamental Research Needs in Photonic Materials Synthesis and Processing at the Interface; Rochester, NY; April 28-30, 2003

肖·H 2003年4月28日至30日在纽约罗切斯特举行的罗切斯特陈大学“光子材料合成和界面处理基础研究需求研讨会”。“将于2003年4月28日至30日在罗切斯特大学举办一次关于界面处光子材料合成和加工的基础研究需要的讲习班。三种材料类将特色：聚合物，分子材料和纳米材料。来自欧洲、日本和美国的顶尖专家将齐聚一堂，概述选定的专业领域。未来研究和开发的肥沃土壤将在邀请的会谈后通过三次分组会议确定。广泛的影响：通信、传感、信息显示和存储、医疗保健等广泛的高科技产业将受益于光子材料合成和加工的长期基础研究。 此外，将强调跨学科合作研究。这将是第一次从化学工程角度讨论光子材料的研讨会，旨在培养与化学，物理，材料科学，电气工程和计算机科学等相关领域的合作研究机会。

Shaw H. ChenUniversity of Rochester"Workshop on Fundamental Research Needs In Photonic Materials Synthesis and Processing at the Interface, to be held in Rochester, NY on April 28 - 30, 2003."A Workshop on Fundamental Research Needs in Photonic Materials Synthesis and Processing at the Interface is to be held at the University of Rochester, 28-30 April 2003. Three materials classes will be featured: polymers, molecular materials, and nano-materials. Leading experts from Europe, Japan, and the United States will gather to provide an overview of selected fields of specialization. Fertile ground for future research and development will be identified by three break-out sessions following the invited talks. Approximately, 21 participants will be invited.Broader Impact: A wide spectrum of high-technology industries, such as communication, sensing, information display and storage, and health care, will benefit from long-term fundamental research in photonic materials synthesis and processing. Also, interdisciplinary collaborative research would be emphasized. This will be the first workshop on photonic materials from the chemical engineering perspective with an aim to cultivating collaborative research opportunities with allied fields such as chemistry, physics, materials science, and electrical engineering and computer science.