SBIR Phase I: Diode-Laser Sensors for Real-Time Control of Semiconductor Processing

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This Small Business Innovation Research (SBIR)Phase I project proposes to support the development of a real-time, insitu sensor for the monitoring and control of next-generation semiconductor etch tools. The sensor is based on ultrasensitive diode-laser absorption techniques for measurements of important native etch products (HF, DF, CO). This novel sensor system will measure concentrations of native etch products insitu with high sensitivity, accuracy, speed and specificity, eliminating the need for auxiliary etch stoplayers. These auxiliary etch stop layers, which are currently used for control of the etch process, increaselayer capacitance, and hence reduce operating speed of the devices in production.This sensor system has direct commercial impact on the next-generation etch tools and theirprocess capabilities. The real-time control afforded by this sensor system will likely become an industrystandard and become a critical subcomponent of the semiconductor etch tool market. Application toother plasma-based process tools is a natural extension of this technology, as well as extension to otherapplication areas including industrial process control, vehicle engine testing, and atmospheric andenvironmental monitoring.