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UHV Studies of Metals Dry-Etching with Beta-Diketones

UHV Studies of Metals Dry-Etching with Beta-Diketones
β-二酮金属干法蚀刻的特高压研究
批准号:
0405394
负责人:
Laura Ford
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2004
资助国家:
美国
项目状态:
已结题
起止时间:
2004-05-01 至 2009-04-30

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中文摘要
翻译
本项目研究β-二酮在铜、氧化铝、镍铁和钨表面的蚀刻和分解反应途径。用β-二酮蚀刻金属与金属层去除和电子工业中的晶片和腔室清洁以及其他潜在应用(例如团聚的非活性催化剂颗粒的再分散)相关。一些β-二酮比目前使用的卤化蚀刻剂对环境更友好。此外,使用比当前工艺更低的温度和压力,这减少了微电子层之间的迁移和扩散。铜用于半导体集成电路和磁记录头,在这些产品的制造过程中,铜必须被蚀刻和沉积。有人提出,当六氟戊二酮在铜上分解时,会形成有害的聚合物;了解聚合物形成机制也是该项目的一部分,以便避免或最小化。将使用俄歇电子能谱、程序升温脱附光谱和反射/吸收红外光谱研究聚合物结构和形成机理,以确定聚合物键合和组成。该项目解决了与具有技术相关性的电子/光子材料相关的基础研究问题。对蚀刻工艺的基本理解和技术进步有利于电子/光子学和环境。该项目有效地整合了研究和教育,并为材料科学领域的研究生和本科生的培训创造了机会,这些领域需要训练有素的劳动力。学生培训的一部分将是参加材料研究小组(MRG),这是一个跨学科小组,旨在让研究生展示他们的工作,并向其他教授通报其他部门正在进行的研究。PI是来自四个参与部门的七位教授之一:化学工程,化学和生物化学,机械工程,物理和工程物理。该小组的一个目标是鼓励教授之间的合作。材料研究小组共同致力于基础广泛,跨学科的教育和培训,让学生接触其他学科的研究,并为他们提供练习公开演讲的机会。
英文摘要
This project addresses etching and decomposition reaction pathways of beta-diketones on copper, aluminum oxide, NiFe, and tungsten surfaces. Etching metals with beta-diketones is relevant to metal layer removal and for wafer and chamber cleaning in the electronics industry, as well as other potential applications such as redispersion of agglomerated, inactive catalyst particles. Some of the beta-diketones are friendlier to the environment than currently used halogenated etchants. Additionally, lower temperatures and pressures than in current processes are used, which decreases migration and diffusion between microelectronics layers. Copper is used in semiconductor integrated circuits and in magnetic recording heads, and copper must be etched as well as deposited in the fabrication of these products. It has been proposed that a detrimental polymer forms when hexafluoropentanedione decomposes on copper; understanding the polymer formation mechanism is also part of this project, so that it can be avoided or minimized. The polymer structure and formation mechanism will be studied using Auger electron spectroscopy, temperature-programmed desorption spectroscopy, and reflection/absorption infrared spectroscopy to determine the polymer bonding and composition. %%% The project addresses fundamental research issues associated with electronic/photonic materials having technological relevance. Basic understanding and technological advances in etching processes are beneficial to electronics/photonics, and to the environment. The project effectively integrates research and education, and creates an opportunity for the training of graduate and undergraduate students in materials science areas where there is an established need for a highly trained workforce. Part of the students' training will be participation in a Materials Research Group (MRG), an interdisciplinary group formed to allow graduate students to present their work and to inform other professors of research going on in other departments. The PI is one of seven professors from four participating departments: Chemical Engineering, Chemistry and Biochemistry, Mechanical Engineering, and Physics and Engineering Physics. A goal of the group is to encourage collaboration between the professors. The Materials Research Group collectively works toward broad based, interdisciplinary education and training by exposing students to other disciplinary research and by providing them the opportunity to practice public speaking.***
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Collaborative Research: REU Site: Solar and Alternative Technologies
  • 批准号:
    1852477
  • 项目类别:
    Standard Grant
  • 资助金额:
    $34.7万
  • 财政年份:
    2019
  • 负责人:
    Laura Ford
  • 依托单位:
Acquisition of an Ultra-high Vacuum Chamber for Etching Studies and Student Training
  • 批准号:
    0216840
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $14.0万
  • 财政年份:
    2002
  • 负责人:
    Laura Ford
  • 依托单位:
海外基金