UHV Studies of Metals Dry-Etching with Beta-Diketones
UHV Studies of Metals Dry-Etching with Beta-Diketones
批准号:
0405394
负责人:
Laura Ford
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2004
资助国家:
美国
项目状态:
已结题
起止时间:
2004-05-01 至 2009-04-30
中文摘要
该项目研究了β-二酮在铜、氧化铝、NiFe和钨表面上的刻蚀和分解反应路径。用β-二酮刻蚀金属与去除金属层、电子工业中的晶片和腔室清洁以及其他潜在的应用相关,例如团聚的、不活跃的催化剂颗粒的再分散。一些β-二酮比目前使用的卤化腐蚀剂对环境更友好。此外,使用了比当前工艺更低的温度和压力,这减少了微电子层之间的迁移和扩散。铜用于半导体集成电路和磁记录头,在制造这些产品时,铜必须被刻蚀和沉积。有人提出,当六氟戊二酮在铜上分解时,会形成有害的聚合物;了解聚合物的形成机理也是该项目的一部分,以便可以避免或减少这种情况。利用俄歇电子能谱、程序升温脱附光谱和反射/吸收红外光谱研究聚合物的结构和形成机理,以确定聚合物的成键和组成。该项目解决与具有技术相关性的电子/光子材料相关的基础研究问题。对蚀刻工艺的基本了解和技术进步对电子学/光子学和环境都是有益的。该项目有效地将研究和教育结合在一起,并为培训材料科学领域的研究生和本科生创造了机会,在这些领域,确实需要一支训练有素的劳动力。学生培训的一部分将是参加材料研究小组(MRG),这是一个跨学科的小组,允许研究生展示他们的工作,并向其他教授通报其他系正在进行的研究。他是来自化学工程、化学和生物化学、机械工程以及物理和工程物理四个参与系的七名教授之一。该组织的一个目标是鼓励教授之间的合作。材料研究小组共同致力于基础广泛的跨学科教育和培训,让学生接触其他学科的研究,并为他们提供练习公开演讲的机会。
英文摘要
This project addresses etching and decomposition reaction pathways of beta-diketones on copper, aluminum oxide, NiFe, and tungsten surfaces. Etching metals with beta-diketones is relevant to metal layer removal and for wafer and chamber cleaning in the electronics industry, as well as other potential applications such as redispersion of agglomerated, inactive catalyst particles. Some of the beta-diketones are friendlier to the environment than currently used halogenated etchants. Additionally, lower temperatures and pressures than in current processes are used, which decreases migration and diffusion between microelectronics layers. Copper is used in semiconductor integrated circuits and in magnetic recording heads, and copper must be etched as well as deposited in the fabrication of these products. It has been proposed that a detrimental polymer forms when hexafluoropentanedione decomposes on copper; understanding the polymer formation mechanism is also part of this project, so that it can be avoided or minimized. The polymer structure and formation mechanism will be studied using Auger electron spectroscopy, temperature-programmed desorption spectroscopy, and reflection/absorption infrared spectroscopy to determine the polymer bonding and composition. %%% The project addresses fundamental research issues associated with electronic/photonic materials having technological relevance. Basic understanding and technological advances in etching processes are beneficial to electronics/photonics, and to the environment. The project effectively integrates research and education, and creates an opportunity for the training of graduate and undergraduate students in materials science areas where there is an established need for a highly trained workforce. Part of the students' training will be participation in a Materials Research Group (MRG), an interdisciplinary group formed to allow graduate students to present their work and to inform other professors of research going on in other departments. The PI is one of seven professors from four participating departments: Chemical Engineering, Chemistry and Biochemistry, Mechanical Engineering, and Physics and Engineering Physics. A goal of the group is to encourage collaboration between the professors. The Materials Research Group collectively works toward broad based, interdisciplinary education and training by exposing students to other disciplinary research and by providing them the opportunity to practice public speaking.***
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Collaborative Research: REU Site: Solar and Alternative Technologies
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批准号:1852477
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项目类别:Standard Grant
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资助金额:$34.7万
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财政年份:2019
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负责人:Laura Ford
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依托单位:
Acquisition of an Ultra-high Vacuum Chamber for Etching Studies and Student Training
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批准号:0216840
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项目类别:Continuing Grant
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资助金额:$14.0万
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财政年份:2002
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负责人:Laura Ford
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依托单位:
海外基金