GOALI: Interactions of Plasmas/Energetic Beams with Organic Masking Materials for Nanoscale Manufacturing

在这个GOALI项目中，马里兰州大学、加州大学伯克利分校、Lam Research Corporation、Shipley Corporation和意大利ITC-Irst的研究人员合作解决了暴露于用于图案转移的等离子体环境中的有机材料中产生的纳米级特征的化学和形态稳定性。总体目标是建立一个原子的理解，用于图案化在纳米级制造/制造的有机材料的蚀刻等离子体的相互作用，并阐明物理/化学的先决条件，以防止引入的功能表面和线边缘粗糙度。该方法包括：1）使用Shipley提供的一组广泛的相关有机材料进行实验，包括模型化合物和完全配制的抗蚀剂系统，以覆盖各种光刻方法的感兴趣的材料; MD; 3）在加州大学伯克利分校的补充离子和自由基束曝光; 4）在ITC IRST的综合材料和表面以及选定的结构分析; 5）在加州大学伯克利分校的等离子体表面与模型化合物相互作用的分子动力学模拟;以及6）模型制定/验证，包括在Lam Research的工业等离子体处理反应器中运行。该项目解决了具有高技术相关性的电子材料专题领域的基础研究问题。粒子的反应性和/或能量通量与限定衬底上的器件的几何特征的大分子的相互作用在纳米制造业以及集成电路和相关工业中是普遍存在的。该项目旨在开发有机掩模图像优化等离子体耐久性所需的大分子特征框架。所获得的基本理解有望指导下一代图案转移技术的发展。该项目的合作方面提供了特殊的教育机会。学生将在技术相关领域接受培训，重点是科学/技术问题的基本，机械方面。通过与Lam Research Corporation和Shipley Corporation的工业合作，学生将获得等离子体技术，先进有机材料和抗蚀剂系统设计的强大背景。与意大利ITC-Irst的合作为该项目提供了一个国际组件，并能够利用先进的表征设施进行材料和表面分析。两所大学的工作是互补的，包括先进的设施，在国家的最先进的处理，诊断，实验和计算机模拟等离子体表面相互作用。参与该项目的学生和研究人员将从学术和工业的角度体验一个以团队合作为导向的研究环境，其中能力的互补性促进了利用相互依赖的精神，以增强思维能力。***

In this GOALI project, researchers at University of Maryland, UC Berkeley, Lam Research Corporation, Shipley Corporation, and ITC-Irst, Italy collaborate to address chemical and morphological stability of nanoscale features produced in organic materials exposed to plasma environments used for pattern transfer. The overall goal is to establish an atomistic understanding of the interactions of etching plasmas with organic materials used for patterning in nanoscale fabrication/manufacturing, and elucidating the physical/chemical prerequisites to prevent the introduction of feature surface and line edge roughness. The approach includes: 1)experiments with a broad set of relevant organic materials, supplied by Shipley, both model compounds and fully formulated resist systems to cover materials of interest for various lithographic approaches; 2)plasma processing of organic materials sets in a well-controlled, well-characterized and modeled reactor at U. MD; 3)complementary ionic and radical beam exposures at UC Berkeley; 4)comprehensive materials and surface and selected structure analysis at ITC IRST; 5)molecular dynamics simulations of the plasma surface interactions with model compounds at UC Berkeley; and 6)model formulation/verification, including runs in industrial plasma processing reactors at Lam Research. %%% The project addresses basic research issues in a topical area of electronic materials with high technological relevance. The interaction of reactive and/or energetic fluxes of particles with macromolecules defining geometric features of devices on a substrate is ubiquitous in nanofabrication, and in integrated circuits and related industries. This project seeks to develop a framework of macromolecular features required for optimized plasma-durability of organic mask images. Fundamental understanding gained is expected to guide the development of next-generation pattern transfer technology. The collaborative aspect of the project provides special opportunities for education. Students will be trained in a technologically relevant area, with a strong emphasis on fundamental, mechanistic aspects of scientific/technical issues. Through the industrial collaboration with Lam Research Corporation and Shipley Corporation students will acquire a strong background in plasma technology, and advanced organic materials and resist system design. The collaboration with ITC-Irst, Italy provides an International component to the project, and the ability to leverage advanced characterization facilities for material and surface analysis. The work at the two universities is complementary, encompassing advanced facilities in state-of-the-art processing, diagnostics, experimental and computer simulation of plasma-surface interactions. The students and researchers involved in this project will experience a teamwork-oriented research environment from both academic and industrial perspectives, where complementarity of competencies fosters a spirit of leveraging interdependency for empowered thinking. ***