GOALI: Interactions of Plasmas/Energetic Beams with Organic Masking Materials for Nanoscale Manufacturing

技术：该项目由一个多学科的学术和工业研究团队进行，旨在从原子层面理解光刻和基于等离子体的纳米级特征/图案转移中使用的有机材料的化学和形态稳定性相关现象。该团队包括马里兰大学、加州大学伯克利分校、Lam研究公司、罗姆哈斯电子材料（RHEM）和意大利特伦托科学技术研究所（ITC-IRST）的研究人员之间建立的合作关系。该方法包括以下内容：广泛的有机材料，包括模型聚合物化合物和完全配方的光刻胶系统，将被合成、表征并提供给该项目（Andes/RHEM）。这些材料将涵盖各种平版印刷方法。基于有机材料光刻图像化的纳米结构也将由RHEM提供；有机材料和纳米结构的等离子体处理[j]。MD)，使用独特的等离子体快门系统，可以研究短时间（~1秒）和传统（~10秒）等离子体曝光时间的影响。使用商业设备和生产晶圆的制造业将执行工业模式转移条件（Hudson/Lam Research）；有机材料的互补、明确的离子、自由基和混合光束暴露（Graves/UCB）；材料，表面和纳米结构表征（马里兰大学，UCB， RHEM和ITC-IRST）。静态飞行时间二次离子质谱法用于等离子体/光束处理（Anderle/ITC-ITR）大分子变化的详细信息；等离子体-聚合物相互作用的分子动力学模拟（Graves/UCB）；在综合数据的基础上建立模型，共同进行模型验证，包括LRC的工业等离子体处理。非技术性：项目涉及电子/光子材料科学领域的基础研究问题，具有较高的技术相关性。研究的跨学科性质，研究任务的互补性和相互依赖性，以及学术和工业研究人员之间的合作，为研究生和本科生提供了特殊的教育机会。

Technical: This GOALI project is being carried out by a multidisciplinary academic and industrial research team aiming for atomistic level understanding of phenomena related to chemical and morphological stability of organic materials utilized in photolithography and plasma-based transfer of nanoscale features/patterns. The team includes established collaborations between researchers at University of Maryland, UC Berkeley, Lam Research Corporation, Rohm & Haas Electronic Materials (RHEM), and Istituto Trentino di Cultura-Institute for Research in Science and Technology, Trento, Italy (ITC-IRST). The approach includes the following: a broad set of organic materials, both model polymer compounds and fully formulated photoresist systems, will be synthesized, characterized and provided to this project (Andes/RHEM). The materials will cover various lithographic approaches. Nanostructures based on photolithographic patterning of the organic materials will also be supplied by RHEM; plasma processing of the organic materials and nanostructures (Oehrlein/U. MD), using a unique plasma shutter system to enable studies of the impact of both short time (~1 s) and conventional (~10s of sec.) plasma exposure times. Industrial pattern transfer conditions used in manufacturing employing commercial equipment and production wafers will be performed (Hudson/Lam Research); complementary well-defined ionic, radical and mixed beam exposures of the organic materials (Graves/UCB); materials, surface and nanostructure characterization (U. MD, UCB, RHEM and ITC-IRST). Static time-of-flight secondary ion mass spectrometry for detailed information on changes of macromolecules by plasma/beam processing (Anderle/ITC-ITR); molecular dynamics simulations of plasma-polymer interactions (Graves/UCB); model formulation based on the composite of the data, model verification, including industrial plasma processing at LRC, will be done jointly. Non-technical: The project addresses basic research issues in a topical area of electronic/photonic materials science with high technological relevance. The interdisciplinary nature of the research, the complementarity and interdependence of the research tasks, and the collaboration among academic and industrial researchers provides exceptional educational opportunities for graduate and undergraduate students.