NIRT: Nanotechnological Manufacturing: Nanostructured Polymers Designed for Plasma/Energetic Beam Templating of Materials

国家科学基金会名称：Oehrlein，Gottlieb S.机构：马里兰大学建议编号：0506988NIRT：纳米技术制造：设计用于等离子体/高能束材料模板的纳米结构聚合物本提案是对NSF 04-043纳米级科学与工程倡议的响应，NIRT类。拟议研究的目的是建立对纳米结构聚合物与图案转移过程中使用的等离子体和高能光束相互作用的原子学理解，并确定在纳米尺度上控制图案形成所需的分子设计参数和等离子体处理参数。这一提议的一个强烈动机是认识到，用于基于软光刻和自组装的新兴纳米光刻方法的有机材料的分子设计不受对短光波长透明度的要求的限制。这一深刻的变化为设计有机掩蔽材料提供了机会，从而大大增强了等离子体环境中的稳定性。这种方法是将一个由学术和工业研究人员组成的跨学科团队聚集在一起，他们通过他们的专业知识和研究能力，能够显著推动受控纳米材料图案化的尖端技术。这包括设计和合成有机成像材料；使用软光刻和自组装技术构建材料的纳米结构；将有机分子暴露在高度可控和表征良好的等离子体环境和高能束中，以及表征和模拟由这些相互作用引起的化学、结构和形貌的变化。项目任务的成功完成将使新的纳米级成像材料的设计在等离子体/高能束流环境中具有更高的化学和结构稳定性，并将导致先进的等离子体设备和工艺的开发。这些都是在纳米尺度上控制材料精确图案化的先决条件，这是未来纳米制造的关键基础之一。不同研究任务的跨学科特征和相互依赖，以及该NIRT项目的大学和行业合作，为参与的学生、博士后研究员、教师和工业研究人员提供了独特的教育机会，并将用于加强基于课堂的教学。

National Science FoundationABSTRACTPI name: Oehrlein, Gottlieb S.Institution: University of MarylandProposal Number: 0506988NIRT: Nanotechnological Manufacturing: Nanostructured Polymers Designed for Plasma/Energetic Beam Templating of MaterialsThis proposal was received in response to Nanoscale Science and Engineering initiative, NSF 04-043, category NIRT. The objective of the proposed research is to establish an atomistic understanding of the interactions of nanostructured polymers with the plasmas and energetic beams used during pattern transfer, and to identify the molecular design parameters and plasma processing parameters required to control patterning at nanoscale dimensions. A strong motivation for this proposal is the recognition that molecular design of organic materials for emerging nanolithographic approaches based on soft lithography and self-assembly is not constrained by the requirement for transparency at short optical wavelengths. This profound change provides the opportunity to design organic masking materials for greatly enhanced stability in plasma environments. The approach is to bring together an interdisciplinary team of academic and industrial researchers, who, through their combined expertise and research capabilities are positioned to significantly advance the cutting edge of controlled nanoscale patterning of materials. This includes design and synthesis of organic imaging materials; nanostructuring the materials using soft lithography and self-assembly, exposing the organic molecules to highly controlled and well-characterized plasma environments and energetic beams, and characterizing and simulating the changes of the chemistry, structure and topography induced by these interactions. Successful completion of the project tasks will enable design of new nanoscale imaging materials with enhanced chemical and structural stability in plasma/energetic beam environments and will lead to the development of advanced plasma equipment\processes. These are prerequisites to controlled precision patterning of materials at the nanoscale, which is one of the critical foundations of future nanotechnological manufacturing. The interdisciplinary character and inter-dependence of the various research tasks along with the university-industry collaboration of this NIRT project provide unique educational opportunities for the students, post-doctoral fellows, faculty and industrial researchers involved, and will be used to enhance class-room based teaching.