NER: Phonon Enhanced Near Field Infrared Lithography
NER: Phonon Enhanced Near Field Infrared Lithography
批准号:
0417838
负责人:
Gennady Shvets
金额:
$0.83万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2004
资助国家:
美国
项目状态:
已结题
起止时间:
2004-01-01 至 2005-06-30
中文摘要
该项目的目标是对与开发“完美”透镜有关的关键问题进行实验和理论研究:透镜的分辨率不受衍射限制。具体来说,我们将展示一种新的纳米光刻方法:声子增强近场红外光刻(PENFIL)。虽然光学光刻和材料图像化的标准技术的分辨率受限于负责光刻过程的辐射波长,但由于其近场性质,我们的方法不受衍射限制。具体而言,目标是:(i)证明超薄(亚微米)SiC薄膜的特性,将可调谐CO2激光器产生的电磁辐射聚焦到小于100 nm的光斑;(ii)研究与制造超薄“完美”SiC透镜有关的关键问题:最佳薄膜沉积技术、衬底材料、成像波长、薄膜厚度和操作温度;(iii)研究两种“完美”透镜的相对优缺点:独立式(真空- sic -真空)透镜和附着基板- sic -基板)透镜;(iv)制定一个路线图,以利用完美的透镜作为纳米光刻和纳米大小的生物和化学物体的电磁传感的实用工具。该计划的主要智力意义在于实验证明了红外频率范围内的完美透镜,这可能会导致纳米技术几个领域的重大进展:纳米级制造、纳米成像和纳米级生物学。例如,可以设想利用红外光进行纳米光刻的纳米制造的创新方法。在红外频率范围内的大功率短脉冲源的可用性使得这一前景非常诱人。潜在的更广泛的影响包括使用最适合这些生物物体的频率的激光对单个细胞和长生物分子(如蛋白质或DNA)的切片进行成像和操作。通过红外辐射激发亚微米大小的细菌孢子的振动模式,还可以设想单个指纹识别。此外,这项研究将使学生接触到广泛的领域,从材料生长到透镜制造再到光学测试,涉及几所大学和布鲁克海文国家实验室。
英文摘要
The objective of this project is to carry out experimental and theoretical efforts on critical issues related to the development of a "perfect" lens: the lens whose resolution is not diffraction limited. Specifically, we will demonstrate a new approach to nanolithography: Phonon Enhanced Near-Field Infrared Lithography(PENFIL). While the resolution of standard techniques of optical lithography and material patterning is limited by the wavelength of radiation responsible for the lithographic process, our approach is not diffraction limited due to its near-field nature. Specifically, the goals are: (i) To demonstrate the property of an ultra-thin (sub-micron) film of SiC to focus the electromagnetic radiation produced by a tunable CO2 laser to a spotsize smaller than 100 nm; (ii) To investigate the critical issues related to manufacturing of an ultra-thin "perfect" SiC lens: optimal film deposition technique, substrate material, imaging wavelength, film thickness, and operation temperature; (iii) To investigate the relative advantages and disadvantages of two types of "perfect" lenses: free-standing (vacuum-SiC-vacuum) lens and the attached substrate-SiC-substrate) lens; and (iv) To develop a roadmap towards utilizing perfect lensing as a practical tool for nanolithography and electromagnetic sensing of nanometer-sized biological and chemical objects.The main intellectual significance of the proposed project is the experimental demonstration of the perfect lensing in the infrared frequency range, which is likely to lead to significant advances in several areas of nanotechnology: nanoscale manufacturing, nanoimaging, and nanoscale biology. For example, innovative approaches to nanofabrication involving nanolithography using infrared light could be envisioned. The availability of high-power short pulse sources in the infrared frequency range make such prospects very appealing. Potential broader impacts include the imaging and manipulation of individual cells and sections of long biological molecules (such as proteins or DNA) using laser light at the frequencies most appropriate for those biological objects. Individual fingerprinting of various bacterial spores of sub-micron size by exciting their vibrational modes with infrared radiation can also be envisioned. In addition, this research will expose students to a broad range of areas from material growth to lens fabrication to optical testing, involving several universities and Brookhaven National Laboratory.
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依托单位:
NER: Phonon Enhanced Near Field Infrared Lithography
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批准号:0304660
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项目类别:Standard Grant
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资助金额:$9.0万
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财政年份:2003
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负责人:Gennady Shvets
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依托单位:
海外基金