RUI: Electron-Induced Reactions in Halomethane Nanoscale Thin Films

RUI：卤甲烷纳米级薄膜中的电子诱导反应

• 批准号: 0455278
• 负责人: Christopher Arumainayagam
• 金额: $ 38万
• 依托单位: Wellesley College
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-08-01 至 2008-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0455278&HistoricalAwards=false
• 关键词: RUI; Electron; Induced; Reactions; Halomethane

AbstractCHE-0455278Arumainayagam/WellesleyIn this RUI research project, Professor Arumainayagam in the Department of Chemistry at Wellesley College is studying the interactions of low energy electrons with halocarbon overlayers on transition metal surfaces. With the support of the Analytical and Surface Chemistry Program, post-irradiation thermal desorption methods are used to identify the formation of active intermediates, and to follow the kinetics and mechanisms of the electron initiated reaction chemistry. This work is providing fundamental information about the mechanisms of radiation induced damage in solids and liquids. This information may be applied in developing an understanding of radiation induced processes in environmental and atmospheric systems. Professor Arumainayagam and his colleagues at Wellesley College are examining the kinetics and mechanisms of electron induced decomposition chemistry of halocarbon overlayers adsorbed on transition metal surfaces. These fundamental investigations provide a vehicle for research training of undergraduate scientists, as well as important knowledge with application to the understanding of environmental and atmospheric reaction cycles.

在这项RUI研究项目中，卫尔斯理学院化学系的Arumainayagam教授正在研究低能电子与过渡金属表面卤素覆盖层的相互作用。在分析和表面化学计划的支持下，使用后辐照热解吸法来鉴定活性中间体的形成，并跟踪电子引发反应化学的动力学和机理。这项工作提供了关于固体和液体中辐射损伤机制的基本信息。这些信息可用于发展对环境和大气系统中辐射诱导过程的理解。韦尔斯利学院的Arumainayagam教授和他的同事们正在研究吸附在过渡金属表面的卤化碳覆层的电子诱导分解化学的动力学和机制。这些基础研究为本科生科学家的研究培训提供了一种工具，也为理解环境和大气反应循环提供了重要的知识。