A Novel Approach for the Development of Accurate ab inito Potential Energy Surfaces for Atomistic Simulations of MEMS Applications
A Novel Approach for the Development of Accurate ab inito Potential Energy Surfaces for Atomistic Simulations of MEMS Applications
批准号:
0457663
负责人:
Ranga Komanduri
金额:
$0.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2005
资助国家:
美国
项目状态:
已结题
起止时间:
2005-09-01 至 2009-08-31
中文摘要
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英文摘要
The objective of the proposed research is to present an integrated approach for conducting simulations at the atomistic level using ab initio quantum mechanical potential-energy surfaces and force fields computed at high-level with extended basis sets. The approach involves (1) electronic structure calculations (using GAUSSIAN 2003 software) of non-equilibrium clusters within the cut-off radius of a material, (2) sampling of the subset of the system configuration space that is important in the dynamics using MD methods augmented with novelty sampling procedures, and (3) accurate interpolation between the computed points using neural network (NN) with early stopping and regularization methods employed to improve network performance. The accuracy of the method will be tested and validated in wide range of manufacturing processing including nanometric cutting, tribology, and material testing. This approach will be extended this to other applications involving carbon nanotubes and synthesis of microcrystalline diamond by chemical vapor deposition (CVD).Molecular dynamics (MD) and Monte Carlo (MC) simulations can be applied for modeling a wide range of manufacturing processes including ultraprecision machining, grinding, and polishing as well as materials testing, and tribology. The method proposed is a generalized method in that it can be applied for a wide range of fields in engineering as well as in basic chemistry, physics, biology, and other scientific fields of endeavor. This problem will be addressed by an interdisciplinary group of researchers from chemistry, electrical engineering, and mechanical engineering, math and materials science background working with graduate and undergraduate (through NSF REU program) students from these disciplines. Research conducted will be fully integrated with the graduate level education. We intend to interact with industry and national laboratories involved in this area. Attempts will be made to recruit U.S. born women, minority, and physically impaired students to work on this project.
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Workshop on Sensing and Prognostics for Scalability of Nanomanufacturing
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批准号:0955249
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项目类别:Standard Grant
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资助金额:$0.5万
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财政年份:2009
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负责人:Ranga Komanduri
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依托单位:
US-India Cooperative Research: Magnetic Field Assisted Finishing Process
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批准号:0217947
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项目类别:Standard Grant
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资助金额:$2.37万
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财政年份:2002
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负责人:Ranga Komanduri
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依托单位:
Modeling of the Ultra-Precision Machining Process Using New Combined Molecular Dynamics/Monte Carlo (MD/MC) Simulation
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批准号:0200327
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项目类别:Continuing Grant
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资助金额:$27.5万
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财政年份:2002
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负责人:Ranga Komanduri
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依托单位:
WORKSHOP: Unsolved Problems and Research Needs in Thermal Analysis of Material Removal Processes; Stillwater, OK, October 23-25, 2002
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批准号:0236289
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项目类别:Standard Grant
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资助金额:$3.38万
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财政年份:2002
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负责人:Ranga Komanduri
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依托单位:
Fundamental and Technological Aspects of Finishing Balls of Advanced Ceramics, Glasses, and Silicon Using Magnetic Field Assisted Polishing
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批准号:0100300
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项目类别:Continuing Grant
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资助金额:$31.0万
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财政年份:2001
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负责人:Ranga Komanduri
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依托单位:
Modeling of High Speed Machining of Difficult-to-Machine Materials
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批准号:0000079
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项目类别:Continuing Grant
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资助金额:$25.0万
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财政年份:2000
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负责人:Ranga Komanduri
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依托单位:
U.S.-Japan Cooperative Science: High Efficiency, Damage Free Finishing of Advanced Materials
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批准号:9603002
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项目类别:Standard Grant
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资助金额:$2.46万
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财政年份:1997
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负责人:Ranga Komanduri
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依托单位:
NSF/EPA Partnership for Environmental Research: Novel Nanocoatings on Cutting Tools for Dry Machining
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批准号:9613111
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项目类别:Standard Grant
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资助金额:$19.0万
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财政年份:1996
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负责人:Ranga Komanduri
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依托单位:
Modeling of the Metal Cutting Process Using Molecular Dynamics (MD) Simulation
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批准号:9523551
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项目类别:Continuing Grant
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资助金额:$32.27万
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财政年份:1995
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负责人:Ranga Komanduri
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依托单位:
Tribological Interactions in Polishing of Advanced Ceramics and Glasses
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批准号:9414610
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项目类别:Standard Grant
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资助金额:$31.19万
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财政年份:1995
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负责人:Ranga Komanduri
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依托单位:
Design, Construction, and Optimization of Magnetic Field Assisted Polishing Equipment
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批准号:9402895
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项目类别:Continuing Grant
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资助金额:$30.5万
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财政年份:1994
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负责人:Ranga Komanduri
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依托单位:
U.S.-China Cooperative Research: Thermal Aspects of Manufacturing Processes
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批准号:9411144
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项目类别:Standard Grant
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资助金额:$1.34万
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财政年份:1994
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负责人:Ranga Komanduri
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依托单位:
Diamond Coatings on Cutting Tools
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批准号:9204345
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项目类别:Continuing Grant
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资助金额:$35.45万
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财政年份:1992
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负责人:Ranga Komanduri
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依托单位:
Engineering Research Equipment Grant: Environmental Scanning Electron Microscope for In-Situ Manufacturing Processes, Materials Engineering and Tribological Studies
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批准号:9112223
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项目类别:Standard Grant
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资助金额:$16.07万
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财政年份:1992
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负责人:Ranga Komanduri
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依托单位:
Symposium on the United States Contributions to Machining and Grinding Research in the Twentieth Century; Stillwater, Oklahoma; November 1991
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批准号:9113730
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项目类别:Standard Grant
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资助金额:$3.28万
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财政年份:1991
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负责人:Ranga Komanduri
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依托单位:
Engineering Research Equipment Grant: Microwave Assisted Chemical Vapor Deposition (CVD) System for Diamond Films/Coatings
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批准号:9007002
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项目类别:Standard Grant
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资助金额:$7.36万
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财政年份:1990
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负责人:Ranga Komanduri
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依托单位:
Special Foreign Currency Travel Support (In Indian Currency)To Attend International Conference on Production Engineering, New Delhi and Srinigar, India, 08/27-09/03/77
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批准号:7723107
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项目类别:Standard Grant
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资助金额:$0.19万
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财政年份:1977
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负责人:Ranga Komanduri
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依托单位:
国内基金
海外基金
EnSite array指导下对Stepwise approach无效的慢性房颤机制及消融径线设计的实验研究
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批准号:81070152
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项目类别:面上项目
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资助金额:10.0万元
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批准年份:2010
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负责人:唐恺
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依托单位: