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Fundamental and Technological Aspects of Finishing Balls of Advanced Ceramics, Glasses, and Silicon Using Magnetic Field Assisted Polishing

Fundamental and Technological Aspects of Finishing Balls of Advanced Ceramics, Glasses, and Silicon Using Magnetic Field Assisted Polishing
使用磁场辅助抛光精加工先进陶瓷、玻璃和硅球的基础和技术方面
批准号:
0100300
负责人:
Ranga Komanduri
金额:
$31.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2001
资助国家:
美国
项目状态:
已结题
起止时间:
2001-04-01 至 2005-09-30

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中文摘要
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英文摘要
This project is on the finishing of balls of advanced ceramics, glasses, and semiconductor material using the magnetic float polishing technology. Conventional finishing of advanced ceramics and glasses by grinding, polishing, lapping generally leads to several defects including large scratches, formation of pits due to the dislodgment of grains, viscous flow of the glassy phase in the case of glass, and surface and subsurface microcracks. These defects affect the properties and performance of these materials and are traditionally removed by subsequent diamond polishing. To address this difficult problem, a "gentle" finishing technology, called the magnetic float polishing was developed (in a recently completed investigation supported by NSF) without the need to use diamond abrasives. Surface finish on the order of 4 nm Ra and 40 nm Rmax with sphericity in the range of 0.25 micrometers were accomplished on Si3N4 balls with a total polishing time of ~ 20 hours. A better understanding of the mechanical and chemo-mechanical actions involved in the polishing of Si3N4 balls has resulted. In this project, the investigators intend to generalize this work to cover other advanced ceramics (balls of different size and number per batch), various glasses, and silicon. Advanced ceramics, such as Si3N4, SiC, Zr02, and Al2O3 are increasing being considered for structural applications of which Si3N4, in specific, is chosen for hybrid ball and roller bearing applications. Similarly, various types of glasses are used for optical applications, such as lenses and recently spherical silicon balls are being considered for micro-electronic applications (instead of silicon wafers). This research would be the first of its kind on the finishing of silicon balls (instead of wafers) by magnetic float polishing. Thus, the finishing technology proposed is expected to address structural, optical, and electronic applications that can have a significant impact on the manufacture of balls for various advanced technology applications.
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Workshop on Sensing and Prognostics for Scalability of Nanomanufacturing
  • 批准号:
    0955249
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.5万
  • 财政年份:
    2009
  • 负责人:
    Ranga Komanduri
  • 依托单位:
A Novel Approach for the Development of Accurate ab inito Potential Energy Surfaces for Atomistic Simulations of MEMS Applications
  • 批准号:
    0457663
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2005
  • 负责人:
    Ranga Komanduri
  • 依托单位:
US-India Cooperative Research: Magnetic Field Assisted Finishing Process
  • 批准号:
    0217947
  • 项目类别:
    Standard Grant
  • 资助金额:
    $2.37万
  • 财政年份:
    2002
  • 负责人:
    Ranga Komanduri
  • 依托单位:
Modeling of the Ultra-Precision Machining Process Using New Combined Molecular Dynamics/Monte Carlo (MD/MC) Simulation
  • 批准号:
    0200327
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $27.5万
  • 财政年份:
    2002
  • 负责人:
    Ranga Komanduri
  • 依托单位:
国内基金
海外基金
SCIENCE CHINA Technological Sciences
SCIENCE CHINA Technological Sciences