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SBIR Phase II: Advanced Laser Patterning of Large Area Thin-Film Electrochromic Devices

SBIR Phase II: Advanced Laser Patterning of Large Area Thin-Film Electrochromic Devices
SBIR 第二阶段:大面积薄膜电致变色器件的先进激光图案化
批准号:
0618631
负责人:
Harvey Kalweit
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2006
资助国家:
美国
项目状态:
已结题
起止时间:
2006-07-15 至 2009-06-30

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中文摘要
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英文摘要
This Small Business Innovation Research (SBIR) Phase II project has the objective of developing and transfering to the production line laser ablation technology for the manufacture of large area thin-film electrochromic (EC) windows. Shadow masking is commonly used to pattern the electrochromic coatings on glass, but it results in unacceptable edge definition and is expensive. Laser ablation can replace masking to allow precise definition of window areas, regardless of size and shape, and has the potential to significantly reduce manufacturing costs.Broader acceptance of electrochromic windows for commercial and residential buildings will enable significant energy savings, and the laser ablation technology is applicable to non-flat shapes, which could extend use of EC windows to other applications.
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