SBIR Phase II: Advanced Laser Patterning of Large Area Thin-Film Electrochromic Devices

SBIR 第二阶段：大面积薄膜电致变色器件的先进激光图案化

• 批准号: 0618631
• 负责人: Harvey Kalweit
• 金额: --
• 依托单位: SAGE ELECTROCHROMICS,INC.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2006
• 资助国家: 美国
• 起止时间: 2006-07-15 至 2009-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0618631&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Advanced; Laser

This Small Business Innovation Research (SBIR) Phase II project has the objective of developing and transfering to the production line laser ablation technology for the manufacture of large area thin-film electrochromic (EC) windows. Shadow masking is commonly used to pattern the electrochromic coatings on glass, but it results in unacceptable edge definition and is expensive. Laser ablation can replace masking to allow precise definition of window areas, regardless of size and shape, and has the potential to significantly reduce manufacturing costs.Broader acceptance of electrochromic windows for commercial and residential buildings will enable significant energy savings, and the laser ablation technology is applicable to non-flat shapes, which could extend use of EC windows to other applications.

这个小型企业创新研究（SBIR）第二阶段项目的目标是开发和转移到生产线激光烧蚀技术，用于制造大面积薄膜电致变色（EC）窗口。 阴影掩蔽通常用于在玻璃上图案化电致变色涂层，但其导致不可接受的边缘清晰度并且是昂贵的。 激光烧蚀技术可以取代掩模技术，实现窗面积的精确定义，无论大小和形状如何，并有可能显著降低制造成本。电致变色窗在商业和住宅建筑中的广泛应用将显著节省能源，激光烧蚀技术适用于非平面形状，这可以将电致变色窗的使用扩展到其他应用。