ACS Tribology Symposium: "Chemical Foundations of Friction and Wear"

ACS摩擦学研讨会：“摩擦和磨损的化学基础”摘要在过去的十年里，摩擦学界对摩擦、润滑和磨损的基本起源重新产生了兴趣。 这些新的努力是由一些与机会和需要有关的独特因素促成的。 通过计算方法和能力的进步、仪器的发展和改进以及新材料的合成和制造，提供了进行更详细研究的机会。 需要更好地了解摩擦学的基本原理，主要是由技术应用需要更严格的控制摩擦界面。 这种需求的例子在微电子、航空航天和生物技术工业中很普遍。 配备了更精确地建模，设计，合成和测量摩擦学界面的工具，社区内的科学家和工程师已经开始在原子和分子（化学）尺度上对摩擦学现象进行理解。NSF对ACS摩擦与磨损化学基础研讨会的支持将汇集来自学术界和工业界的不同科学家，分享他们在该领域的最新进展，融合了应用和基础，实验和理论工作。 通过这种支持提供的机会将使最新成果得以交流，并将通过促进对一个具有广泛重要性的主题的基本理解来影响社会。

ACS Tribology Symposium: "Chemical Foundations of Friction and Wear"Abstract Within the last decade, the tribological community has seen a resurgence of interest in the basic origins of friction, lubrication, and wear. These renewed efforts have been prompted by a number of distinct factors related to both opportunity and need. Opportunities for more detailed research have been provided through advances in computational methods and power, the development and refinement of instrumentation, and the synthesis and fabrication of novel materials. The need for a greater understanding of tribological fundamentals has been driven largely by technological applications requiring more stringent control of the tribological interface. Examples of this need are prevalent in the microelectronics, aerospace, and biotechnology industries. Equipped with the tools to model, design, synthesize, and measure the tribological interface with greater precision, scientists and engineers within the community have begun mapping out an understanding of tribological phenomena on an atomic and molecular (chemical) scale. NSF support of the ACS Chemical Foundations of Friction and Wear Symposium will bring together a diverse group of scientists from academia and industry to share their recent advances in the field, having a blend of applied and fundamental, experimental and theoretical work. The opportunity provided through this support will allow the exchange of the most recent results and will impact society through advancing the fundamental understanding of a topic of widespread importance.