6th NSF-MEXT joint symposium on Nano-systems

CMMI -0652129摘要：美国和日本计划于2006年10月10日、11日和12日在日本东京大学举办一次重点突出的双边研讨会，与会者将是纳米级元件构建系统目标领域的主要研究人员和工程师。研讨会将探讨这些新型纳米材料和系统的机遇、障碍和挑战。通过讲习班，可以设想这两个拥有重大投资的国家之间开展国际合作的可能性。我们将由两国的主要专家对该领域进行审查。这来得正是时候。关于纳米结构单元的结构、电子、光学和输运性质的许多令人兴奋的结果已经取得，本次研讨会旨在提供一个论坛，让纳米系统不同方面的专家聚集在一起，分享信息的状态-相关研究的艺术和讨论未来的前景。建议活动的智力价值。纳米系统是一个高度集成的系统，由许多纳米尺度的元素。与目前以块状或薄膜形式使用的纳米材料不同，纳米系统的制造需要在图案化、加工、定位和互连各个组件方面具有纳米精度。为了实现纳米系统，需要将电子学、光学、机械学（MEMS）、材料科学、生物技术和化学等不同学科在制造和应用方面进行联合收割机。换句话说，所谓的自下而上和自上而下的方法都是需要的。拟议活动产生的更广泛影响。来自NSF和硅谷公司的观察员将参加研讨会。我们还将向选定的学术和工业实验室宣传研讨会，以吸引感兴趣的研究人员，以最大限度地发挥研讨会的影响。讲习班的结果将以报告的形式提交给国家科学基金会，包括幻灯片，供广泛分发。通过讲习班，可以设想这两个拥有重大投资的国家之间开展国际合作的可能性。

CMMI - 0652129ABSTRACT:A focused, bi-lateral US-Japan Workshop is proposed for October 10, 11 and 12 of 2006 at the University of Tokyo, Japan, with leading researchers and engineers in the targeted area of building systems out of nanoscale elements. The workshop will explore the opportunities, barriers and challenges to these novel nanomaterials and systems. The possibilities for international collaboration between the two countries with major investment can be envisaged as a result of the Workshop. We will review the field by leading experts in both countries. This comes at an opportune time. Many exciting results on the structural, electronic, optical, and transport properties of nanoscale building blocks have already been achieved, and this symposium aims to provide a forum where experts in different aspects of nano systems get together, share information on the state-of-the-art of related research and discuss future prospects.Intellectual Merits of the proposal activities.A nano system is a highly integrated system composed of many elements that have dimensions of nanometers. Unlike nano materials that are currently used in bulk or film form, the fabrication of the nano system requires nanometer accuracy in patterning, machining, positioning and interconnecting individual components. In order realize the nano system, it is necessary to combine different disciplines such as electronics, optics,mechanics(MEMS), material science, bio technology and chemistry in terms of fabrication and application. In other words, so-called bottom-up and top-down approaches are both required.Broader Impact Resulting from the Proposed Activities.Observers from NSF and silicon valley companies will attend the Workshop. We will also advertise the workshop to selected academic and industrial labs to attract interested researchers to the audience to maximize the impact of the Workshop. The results of the Workshop will be presented in a report to NSF and made available for wide distribution, including presentation slides. The possibilities for international collaboration between the two countries with major investment can be envisaged as a result of the Workshop.