SBIR Phase I: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

这个小型企业创新研究第一阶段的项目是设计用于无掩模吸收调制光刻的双波长衍射光学元件。吸收调制光刻技术可以在去除昂贵光源的同时获得纳米级的分辨率，成功研制出无掩模吸收调制光学光刻系统将以比扫描电子束光刻更低的成本提供纳米级的分辨率。这项技术提供了分辨率和写入速度的组合，这是目前无法获得的，因此将在纳米制造领域创造一种范式转变。

This Small Business Innovation Research Phase I project is to design dual wavelength diffractive optics for maskless absorbance modulation optical lithography. Absorbance-modulation optical lithography (AMOL) can achieve nanoscale resolution, while getting rid of the expensive photomask.Successful development of a maskless absorbance modulation optical lithograpy system will provide nanoscale resolution at lower costs than scanning electron beam lithography. This technology provides a combination of resolution and writing speed that is currently unavailable, and hence, will create a paradigm shift in the field of nanomanufacturing.