SBIR Phase I: Optical-Maskless-Lithography Equipment

SBIR 第一阶段：光学无掩模光刻设备

• 批准号: 0512402
• 负责人: Rajesh Menon
• 金额: --
• 依托单位: LUMARRAY LLC
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-07-01 至 2005-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0512402&HistoricalAwards=false
• 关键词: SBIR; Phase; Optical; Maskless; Lithography

This Small Business Innovation Research (SBIR) Phase I research project is a step towards building an optical-maskless-lithography technology that could revolutionize patterning for a large variety of applications such as MEMs, microfluidics, biochips, microelectronics, microphotonics, micromagnetics, and nanotechnology. Conventional lithography in the nanoscale has evolved into an extremely expensive, complex, and slow technology, especially for patterning non-manhattan geometries. The company's Zone-Plate-Array Lithography (ZPAL) gets rid of the expensive photomask, and uses a large number of focused-optical beams in order to achieve orders-of-magnitude improvement in writing speed. In this project the company addresses two main thrusts towards achieving a functional ZPAL system: (1) development of a robust technique for the manufacture (by replication or otherwise) of zone-plate arrays, each containing over 1000 zone plates; and, (2) development of an interferometric-spatial-phase-imaging (ISPI) technique for ZPAL that can achieve sub-5nm multi-level (overlay) alignment accuracy. If successful, this project will result in two significant advantages over existing systems. The first one is lower cost than projection systems and the second one is that it will provide large savings in time compared to scanning-electron-beam systems. Maskless optical lithography in the form of ZPAL holds the promise of meeting the resolution, throughput and other requirements of the semiconductor industry, as well as those of the other and emerging applications.

这个小企业创新研究（SBIR）第一阶段研究项目是朝着建立一种光学无掩模光刻技术迈出的一步，该技术可以彻底改变各种应用的图案化，如MEMS，微流体，生物芯片，微电子，微光子学，微磁学和纳米技术。传统的微影技术在奈米尺度上已经发展成为一种非常昂贵、复杂且缓慢的技术，尤其是在非曼哈顿几何图形的图案化上。该公司的Zone-Plate-Array Lithography（ZPAL）摆脱了昂贵的光掩模，并使用了大量的聚焦光束，以实现写入速度的数量级改进。在该项目中，公司致力于实现功能ZPAL系统的两个主要目标：（1）开发用于制造（通过复制或其他方式）波带片阵列的强大技术，每个波带片阵列包含1000多个波带片;以及（2）开发用于ZPAL的干涉空间相位成像（ISPI）技术，可以实现5 nm以下的多级（重叠）对准精度。如果成功的话，这个项目将比现有系统有两个显著的优势。第一个是比投影系统更低的成本，第二个是与扫描电子束系统相比，它将提供大量的时间节省。ZPAL形式的无掩模光刻有望满足半导体行业以及其他新兴应用的分辨率、吞吐量和其他要求。