SBIR Phase I: Relief-Free Infrared Diffraction Optics Based on Semiconductor Materials

SBIR 第一阶段：基于半导体材料的无浮雕红外衍射光学器件

• 批准号: 0740174
• 负责人: Sergei Krivoshlykov
• 金额: $ 10万
• 依托单位: ANTEOS, Inc.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2008
• 资助国家: 美国
• 起止时间: 2008-01-01 至 2008-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0740174&HistoricalAwards=false
• 关键词: SBIR; Phase; Relief; Free; Infrared

This Small Business Innovation Research Phase I research project will fabricate a new generation of relief-free thin-plate semiconductor components of diffraction optics and photonic crystals operating in the infrared spectral region up to wavelengths of about 10 micrometer. The holographic recording of the one-dimensional or two-dimensional sub-wavelength diffraction grating structures will be performed using an already demonstrated proprietary process, which dramatically changes the refractive index of the semiconductor material. The same process can be used for optical recording of various complicated phase structures projected on the semiconductor surface through a mask defining geometry of the structures. The possibility of employing the methods of physical holography for recording the volume phase holograms permit an automatic accounting for all particularities of each specific component with compensation of possible imperfections. The technology will permit fabrication of various relief-free sub-wavelength diffraction components based on semiconductor materials, including photonic crystals, diffraction gratings, spectral filters, polarizing beam splitters, retardation plates, lenses, effective medium optical components and anti-reflecting coatings. It will also allow manufacturing of sub-wavelength diffraction components operating in the mid-infrared (mid-IR) and long-wave infrared (LWIR) regions of the spectrum.

这个小企业创新研究第一阶段的研究项目将制造新一代无浮雕的衍射光学薄板半导体元件和光子晶体，在波长约为10微米的红外光谱区域工作。一维或二维亚波长衍射光栅结构的全息记录将使用已经演示的专有工艺进行，该工艺极大地改变了半导体材料的折射率。通过定义结构几何形状的掩模，同样的过程可以用于投影在半导体表面上的各种复杂相位结构的光学记录。采用物理全息方法记录体相全息图的可能性允许自动计算每个特定组件的所有特性，并补偿可能的缺陷。该技术将允许制造各种基于半导体材料的无反射亚波长衍射元件，包括光子晶体、衍射光栅、光谱滤光片、偏振分束器、延迟板、透镜、有效介质光学元件和抗反射涂层。它还将允许制造在光谱的中红外（mid-IR）和长波红外（LWIR）区域工作的亚波长衍射元件。