SBIR Phase I: Relief-Free Infrared Diffraction Optics Based on Semiconductor Materials
SBIR Phase I: Relief-Free Infrared Diffraction Optics Based on Semiconductor Materials
批准号:
0740174
负责人:
Sergei Krivoshlykov
金额:
$10.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2008
资助国家:
美国
项目状态:
已结题
起止时间:
2008-01-01 至 2008-06-30
中文摘要
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英文摘要
This Small Business Innovation Research Phase I research project will fabricate a new generation of relief-free thin-plate semiconductor components of diffraction optics and photonic crystals operating in the infrared spectral region up to wavelengths of about 10 micrometer. The holographic recording of the one-dimensional or two-dimensional sub-wavelength diffraction grating structures will be performed using an already demonstrated proprietary process, which dramatically changes the refractive index of the semiconductor material. The same process can be used for optical recording of various complicated phase structures projected on the semiconductor surface through a mask defining geometry of the structures. The possibility of employing the methods of physical holography for recording the volume phase holograms permit an automatic accounting for all particularities of each specific component with compensation of possible imperfections. The technology will permit fabrication of various relief-free sub-wavelength diffraction components based on semiconductor materials, including photonic crystals, diffraction gratings, spectral filters, polarizing beam splitters, retardation plates, lenses, effective medium optical components and anti-reflecting coatings. It will also allow manufacturing of sub-wavelength diffraction components operating in the mid-infrared (mid-IR) and long-wave infrared (LWIR) regions of the spectrum.
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SBIR Phase II: Relief-Free Infrared Diffractive Optics Based on Semiconductor Materials
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批准号:0923706
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项目类别:Standard Grant
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资助金额:$50.0万
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财政年份:2009
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负责人:Sergei Krivoshlykov
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依托单位:
国内基金
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