SBIR Phase II: Relief-Free Infrared Diffractive Optics Based on Semiconductor Materials

“该奖项是根据2009年美国复苏和再投资法案（公法111-5）资助的。“这个小型企业创新研究（SBIR）第二阶段项目将开发新一代的无浮雕薄板衍射光学元件，在红外光谱区工作。衍射光学器件采用体积相位全息结构，其使用专有的光改性过程在红外波长下透明的半导体材料中光学记录，用于在低强度光的照射下产生材料折射率的急剧变化。该项目的第一阶段通过展示ZnSe红外材料的光改性和制造第一个模型组件来证明所提出的概念的可行性。所开发的技术可立即应用于制造波长高达1.9 μ m的衍射光学器件、体相位全息光栅和相位延迟板，以及波长高达8 μ m的双折射层。在第二阶段项目中，该技术将被优化并应用于制造在更长波长下工作的红外衍射光学器件的原型组件，包括CO2激光器的重要波长10.6 μ m和大气透明度窗口3-5和8-12 μ m。开发的光改性工艺具有高度适应性，并为制造各种各样的产品创造了丰富的技术平台。这项技术的成功实施将导致新一代的高效率无浮雕红外衍射光学和亚波长组件，包括衍射光栅，分束器，光束整形器，人工双折射半导体材料，相位延迟板和波片。基于半导体材料的无浮雕红外衍射光学元件能够承受高光强并执行复杂的光管理功能。另一个重要的应用是在红外半导体光学器件上制造高稳定性的抗反射（AR）层。红外衍射光学的市场包括国防和航空航天工业、激光工业、光谱器件、传感器和探测器、夜视光学、工业过程控制、材料加工、切割和焊接、环境监测、医疗诊断和手术。

"This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5)."This Small Business Innovation Research (SBIR) Phase II project will develop a new generation of relief-free thin-plate components of diffractive optics operating in the infrared region of spectrum. The diffractive optics employs volume phase holographic structures, which are optically recorded in semiconductor materials transparent at the infrared wavelengths using proprietary process of photo-modification for producing dramatic change of the material refractive index under illumination with low intensity light. Phase I of this project proved feasibility of the proposed concept by demonstrating photo modification of ZnSe infrared material and fabricating the first model components. The developed technology can be immediately applied to fabrication of diffractive optics, volume phase holographic gratings, and phase retardation plates for wavelengths up to 1.9 ìm, as well as antireflection layers for wavelengths up to 8 ìm. In Phase II project the technology will be optimized and applied to fabrication of the prototype components of infrared diffractive optics operating at longer wavelengths, including the important wavelength of CO2 laser 10.6 ìm and windows of atmospheric transparency 3-5 and 8-12 ìm. The developed photo-modification process is highly adaptable and creates a rich technology platform for fabrication of a broad range of products for a large variety of markets. Successful implementation of this technology will result in a new generation of high efficiency relief-free infrared diffractive optics and sub-wavelength components, including diffraction gratings, beam splitters, beam shapers, semiconductor materials with artificial birefringence, phase retardation plates and wave plates. The relief-free components of infrared diffractive optics based on semiconductor materials are capable to withstand high light intensities and perform complicated light management functions. Another important application is the fabrication of highly stable anti-reflection (AR) layers on infrared semiconductor optics. The market for infrared diffractive optics includes defense and airspace industry, laser industry, spectral devices, sensors and detectors, night vision optics, industrial process control, material processing, cutting and welding, environmental monitoring, medical diagnostics and surgery.