SBIR Phase I: Scratch Repair Kit for Indium Tin Oxide Coatings

SBIR 第一阶段：氧化铟锡涂层划痕修复套件

• 批准号: 0740427
• 负责人: Michael Kimble
• 金额: $ 10万
• 依托单位: Reactive Innovations, LLC
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2008
• 资助国家: 美国
• 起止时间: 2008-01-01 至 2008-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0740427&HistoricalAwards=false
• 关键词: SBIR; Phase; Scratch; Repair; Kit

This Small Business Innovation Research (SBIR) project will develop an Indium Tin Oxide (ITO) repair system for restoring the optical and electrical properties of scratched ITO-coated surfaces. These types of materials are used as electrically conducting windows which also provide protection against electromagnetic interference (EMI) in applications such as aircraft windshields and canopies, electro-optical devices, solar cells and EMI shielding.Currently there are no economical solutions to repair or rework the ITO-coated substrates scratch during the manufacturing or use in final applications. The proposed process will directly apply ITO films into the scratched areas. The research will focus on the development of process parameters, including materials, film deposition procedures, to allow the application of the novel coating technique in ambient conditions, rather than having to use high-vacuum equipment or high deposition temperatures. This will allow the technology to be used easily by technicians during manufacture, or in the field for on-site repair using a portable film application kit.The broader impacts of this technology will be ITO-coated aircraft and helicopter canopies, damaged in service due to impact by debris or other materials. This will be a major benefit for the military since the damage to the aircraft due to electromagnetic interference can be quite hazardous. Other major, high-value-added markets include electro-optical devices, such as displays, organic light-emitting diodes (OLEDs)and sensors.The new technology will permit the use of direct patterning processes used in microelectronics manufacture, thereby significantly reducing process costs. This will put the U.S. in a leadership position vis-a vis the Asian manufacturers of the electro-optical devices.

这个小型企业创新研究（SBIR）项目将开发一种氧化铟锡（ITO）修复系统，用于恢复ITO涂层表面划痕的光学和电气性能。这些类型的材料被用作导电窗，其还在诸如飞行器挡风玻璃和遮篷、电光装置、太阳能电池和EMI屏蔽等应用中提供针对电磁干扰（EMI）的保护。目前，没有经济的解决方案来修复或返工在制造期间或在最终应用中使用的ITO涂覆的基板划痕。所提出的工艺将直接将ITO膜应用到划痕区域。该研究将侧重于工艺参数的开发，包括材料，薄膜沉积程序，以允许在环境条件下应用新的涂层技术，而不是必须使用高真空设备或高沉积温度。这将使技术人员在制造过程中或在现场使用便携式薄膜应用工具包进行现场维修时能够方便地使用该技术，这一技术的更广泛影响将是在使用中因碎片或其他材料的撞击而损坏的涂有ITO涂层的飞机和直升机座舱盖。这将是军事上的一个主要好处，因为电磁干扰对飞机的损害可能是相当危险的。其他主要的高附加值市场包括电光器件，如显示器、有机发光二极管和传感器。这项新技术将允许使用微电子制造中使用的直接图案化工艺，从而大大降低工艺成本。这将使美国在维斯亚洲电光器件制造商的竞争中处于领先地位。