SBIR Phase I: Fault Isolation of Open Circuits in Semiconductor Products using Magnetic Current Imaging

SBIR 第一阶段：使用磁流成像对半导体产品中的开路进行故障隔离

• 批准号: 0810388
• 负责人: Antonio Orozco
• 金额: $ 9.99万
• 依托单位: NEOCERA, LLC
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2008
• 资助国家: 美国
• 起止时间: 2008-07-01 至 2008-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0810388&HistoricalAwards=false
• 关键词: SBIR; Phase; Fault; Isolation; Open

This Small Business Innovation Research Phase I research project will extend the capabilities of magnetic current imaging to detect open failures in semiconductor packages with an accuracy of 30 microns to facilitate the integration of semiconductor components and devices into systems. The largest, most difficult problem encountered in packages is electrical opens due to increasing shrinking and complex technology in leading edge designs. The only available techniques are time domain reflectometry with practical resolution of 1-2 mm and time consuming layer-by-layer deprocessing. It is proposed to use magnetic current imaging with a SQUID sensor to solve this critical problem through increasing the frequency detection limit of the equipment to detect high frequency signals at the defect location.The semiconductor industry has a critical need for localization of buried open defects in packages with resolution below 30 microns. The proposed technology is targeting a 30 micron resolution to fill a known gap in fault isolation technology for packaging. For the semiconductor companies it will enable the packaging manufacturing sites to isolate open defects and improve their manufacturing processes to minimize or eliminate these defects quickly so that they can get high quality reliable products to market faster.

这个小型企业创新研究第一阶段研究项目将扩展磁流成像的能力，以检测精度为30微米的半导体封装中的开路故障，以促进将半导体元件和器件集成到系统中。在封装中遇到的最大、最困难的问题是由于前沿设计中日益缩小和复杂的技术而导致的电子开路。唯一可用的技术是实际分辨率为1-2 mm的时域反射仪和耗时的逐层去处理。为了解决这一关键问题，提出使用带有SQUID传感器的磁流成像来提高设备的频率检测极限，以检测缺陷位置的高频信号。半导体行业迫切需要对分辨率低于30微米的封装中的埋置开路缺陷进行定位。这项拟议的技术的目标是30微米的分辨率，以填补封装故障隔离技术的已知空白。对于半导体公司来说，这将使封装制造现场能够隔离公开的缺陷，并改进他们的制造工艺，以最大限度地减少或快速消除这些缺陷，以便他们能够更快地将高质量、可靠的产品推向市场。