Quantum Dot Patterning for Tailored Properties

量子点图案化以实现定制特性

• 批准号: 0906909
• 负责人: Roy Clarke
• 金额: $ 52.44万
• 依托单位: Regents of the University of Michigan - Ann Arbor
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-09-01 至 2015-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0906909&HistoricalAwards=false
• 关键词: Quantum; Dot; Patterning; Tailored; Properties

Technical: This project seeks fundamental understanding of the evolution of epitaxial quantum dot nanostructures. It is anticipated that the outcome of this research will provide insights on what controls the shape, strain, and chemical composition profile in the dot and its vicinity; what factors drive the evolution of quantum dots under different thermodynamic and kinetic conditions; and how directed-assembly, by patterning, can alter the properties of these structures. This study will benefit from new developments demonstrating that direct x-ray phase retrieval methods can non-destructively probe the 3D structure, chemical and strain distributions of epitaxial quantum dots. The plan is to apply Coherent Bragg Rod Analysis (COBRA) mapping techniques to a variety of quantum dot systems, including self-assembly by Stransky-Krastanov growth and droplet epitaxy, as well as novel site directed assembly methods. In-depth x-ray synchrotron studies of patterned dot arrays will be achieved by Focused Ion Beam patterning as well as nanostructure growth on patterned templates made by electron-beam lithography. Site directed deposition of quantum dots has the potential to greatly improve the compositional and geometrical uniformity of quantum confined materials, compared to self assembled dots?this limitation has been holding back widespread implementation of quantum dots for applications. The combination of state-of- the-art materials growth and deposition with advanced x-ray phase reconstruction techniques is expected to provide the means to control critical growth parameters, quantitatively measure their effects on quantum dot structures, and use this information to engineer desirable properties. Non-Technical: The project addresses basic research issues in a topical area of materials science having high technological relevance. The research will contribute basic materials science knowledge at a fundamental level to new understanding and capabilities for semiconductor quantum dot systems of interest for improving existing semiconductor device technologies, such as lasers, and detectors, especially for telecommunications and solar applications. Quantum dot systems may also be an enabling technology for future areas of application such as quantum computing and single electron devices. The project offers research opportunities for graduate training, including experience at national facilities (Advanced Photon Source), and also for more junior students and under-represented groups to develop their interests in science and engineering. The PIs are heavily involved in outreach activities, from junior high through undergraduate research opportunities. They have integrated hands-on activities which resonate with societal needs; for example, they have planned new curriculum on alternate energy applications, and are working with innovative data sharing informatics.

技术：该项目寻求对外延量子点纳米结构演变的基本理解。预计这项研究的结果将提供有关控制点及其附近的形状，应变和化学成分分布的见解;在不同的热力学和动力学条件下，什么因素驱动量子点的演变;以及如何通过图案化直接组装可以改变这些结构的特性。这项研究将受益于新的发展，表明直接x射线相位恢复方法可以非破坏性地探测外延量子点的3D结构，化学和应变分布。该计划是将相干布拉格棒分析（COBRA）映射技术应用于各种量子点系统，包括通过Sttransky-Krastanov生长和液滴外延的自组装，以及新的定点组装方法。深入的X射线同步加速器研究图案化的点阵列将实现聚焦离子束图案化，以及纳米结构的生长图案化的模板由电子束光刻。与自组装量子点相比，量子点的定向沉积有可能大大提高量子限制材料的成分和几何均匀性。这种限制阻碍了量子点应用的广泛实现。最先进的材料生长和沉积与先进的X射线相位重建技术相结合，预计将提供控制关键生长参数的手段，定量测量它们对量子点结构的影响，并使用这些信息来设计所需的性能。非技术性：该项目涉及具有高度技术相关性的材料科学专题领域的基础研究问题。该研究将在基础层面上为半导体量子点系统的新理解和能力做出贡献，以改善现有的半导体器件技术，如激光器和探测器，特别是电信和太阳能应用。量子点系统也可能是未来应用领域的一种使能技术，如量子计算和单电子器件。该项目为研究生培训提供研究机会，包括在国家设施（高级光子源）的经验，并为更多的初级学生和代表性不足的群体发展他们对科学和工程的兴趣。从初中到本科的研究机会，PI大量参与外联活动。他们整合了与社会需求产生共鸣的实践活动;例如，他们计划了关于替代能源应用的新课程，并正在与创新的数据共享信息学合作。