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SBIR Phase II: Novel PECVD (Plasma Enhanced Chemical Vapor Deposition) Single Layer Thin Film Encapsulation for Organic Devices

SBIR Phase II: Novel PECVD (Plasma Enhanced Chemical Vapor Deposition) Single Layer Thin Film Encapsulation for Organic Devices
SBIR 第二阶段:用于有机器件的新型 PECVD(等离子体增强化学气相沉积)单层薄膜封装
批准号:
0948093
负责人:
Ruiqing Ma
金额:
$50.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2010
资助国家:
美国
项目状态:
已结题
起止时间:
2010-03-15 至 2012-02-29
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中文摘要
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英文摘要
This Small Business Innovation Research (SBIR) Phase II project aims to develop a high-rate and large-area manufacturing process for a non-toxic barrier coating that can be used in flexible display and other applications. A flexible single-layer and environmentally-friendly barrier that has both inorganic and organic properties will be used to allow a much thinner barrier to be effective, thus significantly reducing the manufacturing costs. The broader/commercial impact of this project will be the development of a cost-effective thin film encapsulation technology to enable a wide range of applications such as emerging display, imaging, battery and power generating technologies. These applications require a flexible, low-cost, and mostly transparent, thin permeation barrier to prevent oxygen and moisture from causing degradation. In this project, large-area scalability and ability to encapsulate devices made on flexible substrates will be addressed.
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SBIR Phase I: Novel PECVD Single Layer Thin Film Encapsulation for Organic Devices
  • 批准号:
    0839377
  • 项目类别:
    Standard Grant
  • 资助金额:
    $10.0万
  • 财政年份:
    2009
  • 负责人:
    Ruiqing Ma
  • 依托单位:
国内基金
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