SBIR Phase II: Novel PECVD (Plasma Enhanced Chemical Vapor Deposition) Single Layer Thin Film Encapsulation for Organic Devices

SBIR 第二阶段：用于有机器件的新型 PECVD（等离子体增强化学气相沉积）单层薄膜封装

• 批准号: 0948093
• 负责人: Ruiqing Ma
• 金额: $ 50万
• 依托单位: Universal Display Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-03-15 至 2012-02-29
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0948093&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Novel; PECVD

This Small Business Innovation Research (SBIR) Phase II project aims to develop a high-rate and large-area manufacturing process for a non-toxic barrier coating that can be used in flexible display and other applications. A flexible single-layer and environmentally-friendly barrier that has both inorganic and organic properties will be used to allow a much thinner barrier to be effective, thus significantly reducing the manufacturing costs. The broader/commercial impact of this project will be the development of a cost-effective thin film encapsulation technology to enable a wide range of applications such as emerging display, imaging, battery and power generating technologies. These applications require a flexible, low-cost, and mostly transparent, thin permeation barrier to prevent oxygen and moisture from causing degradation. In this project, large-area scalability and ability to encapsulate devices made on flexible substrates will be addressed.

该小型企业创新研究（SBIR）第二阶段项目旨在开发一种高速率和大面积的制造工艺，用于可用于柔性显示器和其他应用的无毒阻隔涂层。 将使用具有无机和有机特性的柔性单层和环保屏障，以允许更薄的屏障有效，从而显著降低制造成本。 该项目的更广泛/商业影响将是开发具有成本效益的薄膜封装技术，以实现广泛的应用，如新兴的显示器，成像，电池和发电技术。 这些应用需要柔性、低成本且大部分透明的薄渗透屏障，以防止氧气和湿气引起降解。 在这个项目中，大面积的可扩展性和封装柔性基板上的设备的能力将得到解决。