SBIR Phase I: Activation and Mobility Profiling for III-V Semiconductor Materials
SBIR Phase I: Activation and Mobility Profiling for III-V Semiconductor Materials
批准号:
1519796
负责人:
Abhijeet Joshi
金额:
$15.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2015
资助国家:
美国
项目状态:
已结题
起止时间:
2015-07-01 至 2015-12-31
中文摘要
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英文摘要
The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase I project will be the development of a novel analysis tool for III-V semiconductor compounds with immediate impact in Light Emitting Diode (LED) manufacturing and high-mobility channel device industries. Currently, relatively low yields during epitaxial growth of the LED semiconductor layers cause a significant loss to the industry. High mobility integrated devices and LED epitaxial development teams have access to methods that provide partial information and metrology about the semiconductor layers. The system proposed here will provide complete electrical data on the materials and could cut significantly improve the feedback time, resulting in higher yields and lower manufacturing costs.This Small Business Innovation Research Phase I project will build a prototype system to directly measure high-resolution mobility and activation profiles for III-V semiconductors. Currently, electrical profiling methods do not measure mobility profiles of activated materials that form the basis of the III-V semiconductor device industries. Thus, researchers cannot take into account the effect of process variations on the mobility profiles of the electronic materials. This prevents the complete electrical characterization of the material, and the optimization of the material growth/implantation and activation processes. The anticipated outcome of this project is a functional system that will provide better and quicker analysis on electronic materials.
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SBIR Phase I: Differential resistance method to profile 3D semiconductor structures
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批准号:1938643
-
项目类别:Standard Grant
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资助金额:$22.5万
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财政年份:2019
-
负责人:Abhijeet Joshi
-
依托单位:
SBIR Phase II: Activation and Mobility Profiling for High-mobility Semiconductor Materials
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批准号:1632322
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项目类别:Standard Grant
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资助金额:$75.0万
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财政年份:2016
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负责人:Abhijeet Joshi
-
依托单位:
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