I-Corps: Novel Flame Base Precursors for Controlled Catalyst Structure

I-Corps：用于受控催化剂结构的新型火焰基前体

• 批准号: 1522671
• 负责人: Radenka Maric
• 金额: $ 5万
• 依托单位: University of Connecticut
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2015
• 资助国家: 美国
• 起止时间: 2015-02-01 至 2016-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1522671&HistoricalAwards=false
• 关键词: Corps; Novel; Flame; Base; Precursors

For many advanced and diverse applications, ranging from chemical sensing, catalysis, and magnetic recording, current research is increasingly focused on exploiting the high surface-to-volume ratios of nanoparticles as a framework for the assembly of complex nanomaterials. Structures including core/shell nanoparticles and multicomponent hierarchical assemblies can exhibit enhanced properties and new functionality arising from the close proximity of chemically-distinct, nanostructured components.Developing scalable fabrication processes that provide the necessary control of nanoparticle structure for enhanced activity presents significant techno-economic challenges for bringing nanoparticles to large- scale industrial catalytic applications. The proposed technology with controlled precursor injection and tightly controlled reaction zones for nanoparticle core-shell formation provides a unique continuous process approach for scaling up core-shell nanocatalyst fabrication and hierarchical assemblies at costs that are relevant for large-scale industrial applications.The proposed Reactive Spray Deposition Technology (RSDT) technology is a thin-film deposition process that overcomes many of the shortcomings of traditional vapor deposition techniques while also replacing conventional multiple step wet processing manufacturing yielding equal or better quality coatings at a lower cost. The RSDT not only provides high quality active films/coatings (e.g.catalysts/electrodes), it also reduces the manpower, catalyst loading amount, energy consumption and number of processing steps required to assemble the films. More specifically, RSDT combines materials synthesis and deposition into a single step with several control features, replacing at least 5 unit operations in a conventional electrode manufacturing scheme.

对于许多先进的和不同的应用，从化学传感，催化和磁记录，目前的研究越来越多地集中在利用纳米粒子的高表面积与体积比作为复杂纳米材料组装的框架。包括核/壳纳米颗粒和多组分分级组装体的结构可以表现出增强的性质和由化学上不同的纳米结构化组分的紧密接近引起的新功能性。开发可扩展的制造工艺，其提供用于增强活性的纳米颗粒结构的必要控制，为将纳米颗粒引入大规模工业催化应用提出了重大的技术经济挑战。所提出的具有用于纳米颗粒核-壳形成的受控前体注入和严格控制的反应区的技术提供了一种独特的连续工艺方法，用于以与大规模工业应用相关的成本按比例放大核-壳纳米催化剂制造和分级组装。膜沉积工艺克服了传统气相沉积技术的许多缺点，同时还取代了传统的多步湿法加工制造，以较低的成本产生相同或更好质量的涂层。RSDT不仅提供高质量的活性膜/涂层（例如催化剂/电极），还减少了组装膜所需的人力、催化剂装载量、能耗和加工步骤的数量。更具体地说，RSDT将材料合成和沉积结合到具有几个控制特征的单个步骤中，取代了传统电极制造方案中的至少5个单元操作。