I/UCRC FRP: Collaborative Research: Super-resolution methods for microwave emission source microscopy

I/UCRC FRP：合作研究：微波发射源显微镜的超分辨率方法

• 批准号: 1535698
• 负责人: Victor Khilkevich
• 金额: $ 13.19万
• 依托单位: Missouri University of Science and Technology
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2015
• 资助国家: 美国
• 起止时间: 2015-08-15 至 2018-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1535698&HistoricalAwards=false
• 关键词: UCRC; FRP; Collaborative; Research; Super

As clock speeds and data rates in electronic products increase, the problem of unwanted electromagnetic emissions become more and more severe. As a result, during the development of electronic products, considerable amounts of time and effort are spent by electronic device designers in tracking down and resolving electromagnetic compliance issues. Due to the lack of appropriate sensing tools, very often electromagnetic compatibility engineers have to resort to ad hoc trial-and-error techniques to determine compliance, which slows down the device development cycle. Emission source microscopy provides a potentially powerful tool that can improve this situation by imaging and/or mapping the locations of radiating sources in electronic products. However, being essentially equivalent to a microwave microscope, the emission source microscopy technique, presently, has resolution limits that only make it useful at frequencies above ~5 GHz. This research explores ways to improve the resolution limit of microwave microscopy, making it applicable to lower frequencies where the majority of electronic compliance problems occur. Besides direct application in locating sources of unwanted radiation with high accuracy and confidence, which ultimately will reduce production delays, the proposed methods can also be used in the research of radiation mechanisms of electromagnetic energy. Additional broader impacts include the use of this new technology as an educational tool for the visualization of microwave electromagnetic radiation sources. The ultimate goal of this research is to develop super-resolution techniques for microwave emission source microscopy so it can be used to detect sources of electromagnetic radiation with sub-diffraction limit resolution. Research foci to be explored include: (1) development of super-resolution microwave microscopy systems with special point spread function; (2) development of super-resolution microwave microscopy systems with water immersion; and (3) development of STED-inspired super-resolution microwave microscopy systems using movable absorber screens or optically-modulated absorber layers. For each system prototypes will be developed and the resulting resolution, dynamic range, and sensitivity of the technique will be examined experimentally. Measurements will come from experiments with passive structures excited by external sources and active electronic devices.

随着电子产品时钟速度和数据速率的提高，不必要的电磁辐射问题变得越来越严重。因此，在电子产品的开发过程中，电子设备设计人员花费了大量的时间和精力来跟踪和解决电磁合规性问题。由于缺乏合适的传感工具，电磁兼容性工程师经常不得不求助于临时的试错技术来确定合宪性，这减慢了设备的开发周期。发射源显微镜提供了一种潜在的强大工具，可以通过成像和/或绘制电子产品中辐射源的位置来改善这种情况。然而，发射源显微镜技术本质上相当于微波显微镜，目前的分辨率限制使其只能在~ 5ghz以上的频率上使用。本研究探索了提高微波显微镜分辨率限制的方法，使其适用于大多数电子遵从性问题发生的较低频率。该方法不仅可直接用于高精度定位有害辐射源，最终减少生产延迟，还可用于电磁能量辐射机理的研究。其他更广泛的影响包括使用这项新技术作为微波电磁辐射源可视化的教育工具。本研究的最终目标是开发微波发射源显微镜的超分辨率技术，使其可以用于检测亚衍射极限分辨率的电磁辐射源。今后的研究重点包括：(1)开发具有特殊点扩展函数的超分辨微波显微系统；(2)水浸超分辨微波显微系统的研制；(3)利用可移动吸收屏或光调制吸收层开发sted启发的超分辨率微波显微镜系统。对于每个系统的原型将被开发，并由此产生的分辨率，动态范围和灵敏度的技术将被实验检查。测量将来自外部源和有源电子设备激发的无源结构的实验。