MRI: Acquisition of Three-Ion-Beam Microscopy System for Advanced Nanofabrication and Imaging

这项重大研究仪器（MRI）拨款将使我们能够从卡尔蔡司显微镜公司购买三离子束显微镜，ORION NanoFab系统。这种三光束系统可以为材料和器件的制造和表征提供前所未有的分辨率，精度和多功能性，一直到纳米尺度（大约是原子间距的几倍）。 ORION NanoFab系统预计将对跨学科纳米科学研究产生重大影响，特别是在量子物质和技术、医学和生物工程、光子和光电研究、超材料和可再生能源科学领域。 三束系统将位于加州理工学院（Caltech）的Kavli纳米科学研究所（KNI），该研究所为加州理工学院、喷气推进实验室（JPL）以及南加州更大地区的公司和其他研究所的研究人员提供了最先进的基础设施和集中的纳米纤维和纳米表征设施。 由于这种形式的三光束显微镜仅处于起步阶段，加州理工学院还将与蔡司合作开展技术推广工作，将专家聚集在一起，推进三光束工具的新想法和应用。 该合作推广计划包括：在加州理工学院举办年度研讨会，与ORION NanoFab的工业和全球研究社区用户交流研究亮点，技术挑战以及新技术开发和应用方面的信息。 作为推广工作的一部分，还计划为K-12学生提供纳米科学“演示日”，其中ORION NanoFab的先进仪器和KNI的其他工具可用于探索纳米世界，以及在加州理工学院为当地高中学生和教师举办纳米科学和技术（nano-S T）主题的讲座和实验室图尔斯参观&这项重大研究仪器（MRI）拨款将使我们能够从卡尔蔡司显微镜公司购买三离子束显微镜，ORION NanoFab系统。 ORION NanoFab是一种三离子束纳米制造和显微镜系统，成像分辨率为0.5 nm，切割分辨率为#8818;2nm，几乎不受材料的影响。该系统被设计为在镓、氖和氦束之间无缝切换，因此人们可以选择采用镓聚焦离子束（FIB）在微米尺度上对材料进行图案化，利用强大而温和的氖束进行快速精密纳米加工，或者使用氦束来制造精细的亚10纳米结构，这需要极高的加工保真度和/或精细材料的切割（例如石墨烯），其易于被高能电子或重元素离子束损坏。它的无掩模纳米图案化能力也最大限度地减少了由于处理和去除掩模所需的多个步骤而可能造成的污染。 ORION NanoFab系统预计将对跨学科纳米科学研究产生重大影响，特别是在量子物质和技术、医学和生物工程、光子和光电研究、超材料和可再生能源科学领域。 三束系统将位于加州理工学院（Caltech）的Kavli纳米科学研究所（KNI），该研究所为加州理工学院、喷气推进实验室（JPL）以及南加州更大地区的公司和其他研究所的研究人员提供了最先进的基础设施和集中的纳米纤维和纳米表征设施。 与蔡司合作，我们还计划将工业界和全球研究界聚集在加州理工学院举办一系列年度研讨会，旨在帮助推进多光束显微镜和纳米纤维的技术和应用。

This Major Research Instrumentation (MRI) grant will enable the acquisition of a three-ion-beam microscope, the ORION NanoFab system, from Carl Zeiss Microscopy. This tri-beam system can provide unprecedented resolution, precision and versatility for the fabrication and characterization of materials and devices all the way down to the nanometer scale (roughly a few times the atomic spacing). The ORION NanoFab system is expected to make a significant impact on interdisciplinary nanoscience research, particularly in the areas of quantum matter and technology, medical and bio-engineering, photonic and optoelectronic research, meta-materials, and renewable energy science. The tri-beam system will be located at the Kavli Nanoscience Institute (KNI) of the California Institute of Technology (Caltech), which provides laboratories with state-of-the-art infrastructure and houses centralized nanofabrication and nano-characterization facilities for researchers at Caltech, the Jet Propulsion Laboratory (JPL), and corporations and other institutes in the greater area of Southern California. As this form of tri-beam microscopy is only in its infancy, Caltech will also be partnering with Zeiss in a technical outreach effort to bring experts together to advance new ideas and applications of the tri-beam tool. This collaborative outreach plan includes: hosting annual workshops at Caltech with industrial and global research-community users of the ORION NanoFab to exchange information on research highlights, technical challenges, and new technical developments and applications. As part of outreach effort there is also a plan to offer nanoscience "demo days" for K-12 students in which the advanced instrumentation of the ORION NanoFab and other tools in the KNI can be used to explore the nanoscopic world, as well as lectures and lab tours at Caltech to local high school students and teachers on topics of nano-science and technology (nano-S&T) and applications of modern microscopy.This Major Research Instrumentation (MRI) grant will enable the acquisition of a three-ion-beam microscope, the ORION NanoFab system, from Carl Zeiss Microscopy. The ORION NanoFab is a three-ion-beam nano fabrication and microscopy system capable of an imaging resolution of 0.5 nm and a cutting resolution of ≲2nm, virtually independent of material. The system is designed to seamlessly switch between gallium, neon and helium beams, so that one has the option of employing the gallium focused ion beam (FIB) to pattern materials at the micro-scale, taking advantage of the powerful yet gentle neon beam for precision nano-machining with speed, or using the helium beam to fabricate delicate sub-10 nm structures that demand extremely high machining fidelity and/or cutting of delicate materials (such as graphene) that are prone to damage by high-energy electrons or heavy-element ion beams. Its capability of maskless nano-patterning also minimizes possible contamination due to the multiple steps required in processing and removing masks. The ORION NanoFab system is expected to make a significant impact on interdisciplinary nanoscience research, particularly in the areas of quantum matter and technology, medical and bio-engineering, photonic and optoelectronic research, meta-materials, and renewable energy science. The tri-beam system will be located at the Kavli Nanoscience Institute (KNI) of the California Institute of Technology (Caltech), which provides laboratories with state-of-the-art infrastructure and houses centralized nanofabrication and nano-characterization facilities for researchers at Caltech, the Jet Propulsion Laboratory (JPL), and corporations and other institutes in the greater area of Southern California. In partnership with Zeiss we also plan to bring together the industrial and global research-communities in a series of annual workshops at Caltech designed to help advance the technology and applications of multi-beam microscopy and nanofabrication.