The Generation of Ultra-Low Emittance Beams by Downramp Injection in a Plasma Wakefield Accelerator
The Generation of Ultra-Low Emittance Beams by Downramp Injection in a Plasma Wakefield Accelerator
批准号:
1734315
负责人:
Chan Joshi
金额:
$32.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2017
资助国家:
美国
项目状态:
已结题
起止时间:
2017-08-15 至 2020-07-31
中文摘要
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英文摘要
The goal of this project is to explore a new method for generating high quality electron beams. High quality electron beams are needed for many applications such as electron microscopy, free electron lasers and high-energy colliders. One measure of quality of an electron beam is its emittance. This is because a small emittance beam can be focused to a very small spot size, desirable in these applications. This project will explore generation of extremely low emittance electron beams using three-dimensional simulations of a new electron acceleration scheme that takes advantage of the ability to control particle density in a Plasma-Based Accelerator.It is now well established that Plasma-Based Accelerators (PBAs) are capable of self-generating ultra-relativistic electron bunches that contain a significant amount of charge, have a short duration, and a low normalized emittance. These beam quantities are often combined into a single figure of merit called the normalized beam brightness. Ultra-high brightness beams are needed in accelerator-based X-ray light sources. While PBA experiments have produced useful beams, they have not yet produced beams with the necessary brightness and energy spread needed to drive an X-ray free-electron-laser, nor the charge and emittance needed as an injector for a future linear collider. This project will explore the acceleration of electrons across a sharp density downramp in a plasma through theory and computer simulations, and through an experiment that will be carried out at the FACET II facility at SLAC.
期刊论文(3)
专著(0)
科研奖励(0)
会议论文
High quality electron bunch generation using a longitudinal density-tailored plasma-based accelerator in the three-dimensional blowout regime
在三维井喷状态下使用纵向密度定制的等离子体加速器产生高质量电子束
DOI:
--
发表时间:
2017
期刊:
PHYSICAL REVIEW ACCELERATORS AND BEAMS
影响因子:
1.7
作者:
[X. L. Xu, F. Li, W. An, T. N. Dalichaouch, P. Yu, W. Lu, C. Joshi, W. B. Mori]
通讯作者:
W. B. Mori
DOI:
10.1088/1361-6587/aab3b5
发表时间:
2018-05-01
期刊:
PLASMA PHYSICS AND CONTROLLED FUSION
影响因子:
2.2
作者:
[Lemos, N., Albert, F., Joshi, C.]
通讯作者:
Joshi, C.
Experimental signatures of direct-laser-acceleration-assisted laser wakefield acceleration
直接激光加速辅助激光尾场加速的实验特征
DOI:
10.1088/1361-6587/aaade1
发表时间:
2018
期刊:
Plasma Physics and Controlled Fusion
影响因子:
2.2
作者:
[Shaw, J L, Lemos, N, Marsh, K A, Froula, D H, Joshi, C]
通讯作者:
Joshi, C
Measurements of Electron Weibel Instability in a Laboratory Plasma Using Relativistic Electron Beams
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批准号:2003354
-
项目类别:Continuing Grant
-
资助金额:$60.0万
-
财政年份:2020
-
负责人:Chan Joshi
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依托单位:
Development of the Ionization-Injection Scheme for Generating High-Quality, Multi-GeV Electron Beams from a Plasma Wake Field Accelerator, Using the FACET Facility at SLAC
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批准号:1415386
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项目类别:Standard Grant
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资助金额:$105.0万
-
财政年份:2014
-
负责人:Chan Joshi
-
依托单位:
Collaborative Research: Graduate Student Training Through Research on Plasma-Based Accelerators
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批准号:0936266
-
项目类别:Standard Grant
-
资助金额:$225.77万
-
财政年份:2009
-
负责人:Chan Joshi
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依托单位:
Second Laser Acceleration of Particles Workshop; Los Angeles, California; January 7-18, 1985 (Physics)
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批准号:8416864
-
项目类别:Standard Grant
-
资助金额:$1.0万
-
财政年份:1985
-
负责人:Chan Joshi
-
依托单位:
国内基金
海外基金
磷脂酶Ultra特异性催化油脂体系中微量磷脂分子的调控机制研究
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批准号:31471690
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项目类别:面上项目
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资助金额:90.0万元
-
批准年份:2014
-
负责人:王永华
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依托单位:
适应纳米尺度CMOS集成电路DFM的ULTRA模型完善和偏差模拟技术研究
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批准号:60976066
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项目类别:面上项目
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资助金额:41.0万元
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批准年份:2009
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负责人:何进
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依托单位: