I-Corps: High-Throughput Manufacturing of Three-Dimensional Nanostructured Materials

I-Corps：三维纳米结构材料的高通量制造

• 批准号: 1806158
• 负责人: Rhonda Shrader
• 金额: $ 5万
• 依托单位: University of California-Berkeley
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2018
• 资助国家: 美国
• 起止时间: 2018-01-01 至 2018-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1806158&HistoricalAwards=false
• 关键词: Corps; Throughput; Manufacturing; Three; Dimensional

The broader impact / commercial potential of this I-Corps project is to better identify the commercial opportunity for three-dimensional nanostructured materials made via high-throughput holographic methods. These materials have a truss-like structure at submicron length scales, giving them better properties like improved strength-to-weight ratio. An analogy would be how we use trusses for bridges instead of solid hunks of steel. This manufacturing method will enable industrial-scale manufacturing of materials useful in multiple US industries. For example, membrane separations are used, for example, in biomedical testing, drug and therapeutic production, scientific research, and water treatment. Optical devices such as cameras, microscopes, and lighting could also be improved by various types of these three-dimensional nanostructured materials.This I-Corps project will identify the particular advantages of CHISEL (coordinated holographic industrial-scale electromagnetic lithography), which has the potential to greatly reduce the cost of three-dimensional nanostructured materials. Conventional photolithography for making integrated circuits is high quality, but slow and costly. Techniques such as imprint lithography are faster and cheaper, but limited to making essentially two-dimensional structures. CHISEL will enable continuous nanoscale manufacturing with high throughput. The method controls the phase of several interfering optical beams to continuously pattern a photosensitive material. A first-generation CHISEL tool (i.e. alpha tool) can have a volume patterning rate several orders of magnitude greater than conventional projection lithography (and with comparable or less capital cost).

I-Corps项目更广泛的影响/商业潜力是更好地识别通过高通量全息方法制造的三维纳米结构材料的商业机会。这些材料在亚微米长度尺度上具有类似桁架的结构，使它们具有更好的性能，如提高强度重量比。一个类似的例子是我们如何使用桁架来代替坚固的大块钢。这种制造方法将使美国多个行业有用的材料的工业规模制造成为可能。例如，膜分离被用于生物医学测试、药物和治疗生产、科学研究和水处理。诸如照相机、显微镜和照明等光学设备也可以通过各种类型的三维纳米结构材料得到改进。这个I-Corps项目将确定CHISEL（协调全息工业规模电磁光刻）的特殊优势，它有可能大大降低三维纳米结构材料的成本。用于制造集成电路的传统光刻技术质量高，但速度慢且成本高。像压印光刻这样的技术更快更便宜，但仅限于制造本质上的二维结构。CHISEL将实现高吞吐量的连续纳米级制造。该方法控制几个干涉光束的相位来连续地对光敏材料进行图像化。第一代CHISEL工具（即alpha工具）可以具有比传统投影光刻大几个数量级的体积图案速率（并且具有相当或更低的资本成本）。