Programming Ink Deposition Dynamically: The New Science of Direct Ink Writing
Programming Ink Deposition Dynamically: The New Science of Direct Ink Writing
批准号:
1825626
负责人:
Yayue Pan
金额:
$42.59万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2018
资助国家:
美国
项目状态:
已结题
起止时间:
2018-08-15 至 2023-07-31
中文摘要
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英文摘要
Direct Ink Writing (DIW) is a class of three-dimensional (3D) printing that builds a 3D object by depositing functional and/or structural liquid materials (ink) onto a substrate in a layer-by-layer approach. This award supports fundamental research to provide new knowledge for control of ink deposition on substrates or previously printed layers. The research will advance DIW technology toward a higher achievable resolution, more flexible ink design, higher print quality, and a much wider choice of substrates. DIW has applications in a number of industries, including health care, electronics, automotive, aerospace and defense, and therefore this research directly impacts economic welfare and national security. Furthermore, the developed knowledge of ink deposition control could be applied to almost any droplet- or liquid filament-based process. 45.6 percent of undergraduate students in the UIC College of Engineering are from groups traditionally underrepresented in STEM. The PIs will work actively to involve underrepresented minority students in workshops, seminars, and mini-symposiums that are created from this project. Research outcomes will be incorporated into three engineering courses at UIC, the Engineering Summer Camp at UIC, and the 3D printing learning modules for Women In Engineering (WIEP) K-12 outreach programs. Dynamic and localized control of ink wettability on substrates or previously printed layers is pivotal for addressing current tolerance and repeatability challenges and advancing DIW technologies. The objective of this project is to test the hypothesis that wetting properties of leaky dielectric liquid droplets/filaments on substrates change dynamically when an electric field is applied, thus enabling accurate direct writing of inks on a wide range of substrates. The applied electric field is programmed in a pixel-by-pixel and layer-by-layer way, so that it manipulates ink deposition at any location, in any layer, and on any substrate. The research team will perform multiphysics modeling and experiments to understand the ink electrowetting dynamics, design and construct electric mask (e-Mask) generation systems, establish a novel e-Mask assisted DIW system and process, and assess the new DIW system.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
期刊论文(13)
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Machine Learning-Based Modeling of Electric-Field-Assisted Direct Ink Writing (EDIW) Process
基于机器学习的电场辅助直接墨水书写 (EDIW) 过程建模
DOI:
10.1115/msec2023-106095
发表时间:
2023
期刊:
American Society of Mechanical Engineers
影响因子:
--
作者:
[Chen, Yinong, Deshpande, Anupam Ajit, Joyee, Erina Baynojir, Pan, Yayue]
通讯作者:
Pan, Yayue
Printable Highly Transparent Natural Fiber Composites
可打印的高透明天然纤维复合材料
DOI:
10.1016/j.matlet.2020.128290
发表时间:
2020
期刊:
Materials Letters
影响因子:
3
作者:
[Jiang, Yizhou, Yarin, Alexander L., Pan, Yayue]
通讯作者:
Pan, Yayue
DOI:
10.1002/adfm.202006683
发表时间:
2020-10-16
期刊:
ADVANCED FUNCTIONAL MATERIALS
影响因子:
19
作者:
[Cheng, Meng, Ramasubramanian, Ajaykrishna, Shahbazian-Yassar, Reza]
通讯作者:
Shahbazian-Yassar, Reza
DOI:
10.1007/s00348-021-03153-3
发表时间:
2021-03-01
期刊:
EXPERIMENTS IN FLUIDS
影响因子:
2.4
作者:
[Plog, J., Jiang, Y., Yarin, A. L.]
通讯作者:
Yarin, A. L.
DOI:
10.1016/j.jmapro.2021.07.028
发表时间:
2021-09
期刊:
Journal of Manufacturing Processes
影响因子:
6.2
作者:
[Yizhou Jiang;Xinnian Wang;J. Plog;A. Yarin;Yayue Pan]
通讯作者:
Yizhou Jiang;Xinnian Wang;J. Plog;A. Yarin;Yayue Pan
共 11 条
A Study of Electric Field-Assisted Direct Ink Writing with Conducting Polymers for Electronic Textiles (E-textiles)
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批准号:2224749
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项目类别:Standard Grant
-
资助金额:$49.64万
-
财政年份:2022
-
负责人:Yayue Pan
-
依托单位:
Collaborative Research: Acoustic Field-Assisted Stereolithography for Multi-Material Additive Nanomanufacturing
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批准号:1663399
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项目类别:Standard Grant
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资助金额:$15.04万
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财政年份:2017
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负责人:Yayue Pan
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依托单位:
Layerless Additive Manufacturing of 3D Objects with Wide Solid Cross Sections
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批准号:1563477
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项目类别:Standard Grant
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资助金额:$29.53万
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财政年份:2016
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负责人:Yayue Pan
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依托单位:
国内基金
海外基金
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