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MRI: Acquisition Of an Atomic Layer Deposition System

MRI：原子层沉积系统的采集

基本信息

批准号：
1828090
负责人：
Hanwei Gao
金额：
$ 30.1万
依托单位：
Florida State University
依托单位国家：
美国
项目类别：
Standard Grant
财政年份：
2018
资助国家：
美国
起止时间：
2018-08-01 至 2021-07-31
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=1828090&HistoricalAwards=false
关键词：
MRI Acquisition Atomic Layer Deposition

项目摘要

This award from the Major Research Instrumentation program supports Florida State University (FSU) with the acquisition of an Atomic Layer Deposition (ALD) system. The system will enhance the materials research and education in the northern Florida region. ALD is an advanced thin film deposition technique with a unique operating principle enabling thin film deposition with unprecedented precision of thickness down to single atomic layers. Applications of ALD, in both industrial and academic research, have led to remarkable advancements in materials development for microelectronics, sustainable energy, advanced batteries, chemical and biological sensing, lighting and display technology, etc. The ALD system acquired through this award will be installed in the Condensed Matter and Materials Physics (CMMP) User Facility where the impact of the instrument will be maximized with broad access available to the entire research community in the region, including minority-serving institutions, and women's colleges as well as industrial partners. This facility will also serve as a basis for student training and education at all level from K-12 to graduate schools.The Atomic Layer Deposition (ALD) system will particularly enhance the nanofabrication capabilities at Florida State University (FSU) by creating thin films with pinhole-free quality, conformal morphology, and atomic layer precision. With its strong commitments in materials research, FSU is in pressing need of these unique features and capabilities especially since materials and devices with three-dimensional surface microstructures have become increasingly involved in recent research activities. At least fifteen research groups at FSU and FAMU, in disciplines spanning across physics, chemistry & biochemistry, chemical & biomedical engineering, mechanical engineering, and electrical engineering, will benefit immediately from regular access to an ALD system, covering research subjects from nanoelectronics, nanophotonics, solar energy harvesting, energy storage, photocatalysis, and spintronics. Not only will the current research projects benefit from this instrument acquisition, new collaborative activities are expected to be inspired by sharing the ALD in an interactive and multidisciplinary environment.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

该奖项来自主要研究仪器项目，支持佛罗里达州立大学（FSU）获得原子层沉积（ALD）系统。该系统将加强北佛罗里达地区的材料研究和教育。ALD是一种先进的薄膜沉积技术，具有独特的工作原理，能够以前所未有的厚度精度沉积到单原子层。ALD在工业和学术研究中的应用，在微电子、可持续能源、先进电池、化学和生物传感、照明和显示技术等领域的材料开发方面取得了显着进步。通过该奖项获得的ALD系统将安装在凝聚态物质和材料物理（CMMP）用户设施中，该设施将最大限度地发挥该仪器的影响，并广泛提供给该地区的整个研究界，包括少数民族服务机构、女子学院以及工业合作伙伴。该设施还将作为从K-12到研究生院各级学生培训和教育的基础。原子层沉积（ALD）系统将通过创建无针孔质量、保形形貌和原子层精度的薄膜，特别提高佛罗里达州立大学（FSU）的纳米制造能力。由于其在材料研究方面的坚定承诺，FSU迫切需要这些独特的功能和能力，特别是因为具有三维表面微结构的材料和设备越来越多地参与到最近的研究活动中。FSU和FAMU至少有15个研究小组，涵盖物理、化学与生物化学、化学与生物医学工程、机械工程和电气工程等学科，将立即受益于定期访问ALD系统，涵盖纳米电子学、纳米光子学、太阳能收集、能量储存、光催化和自旋电子学等研究课题。不仅目前的研究项目将受益于这次仪器的收购，新的合作活动也有望通过在互动和多学科环境中共享ALD而受到启发。该奖项反映了美国国家科学基金会的法定使命，并通过使用基金会的知识价值和更广泛的影响审查标准进行评估，被认为值得支持。