Professional Experiences for Students in Plasma Science: Student Travel Support to Attend the 2018 Gaseous Electronics Conference

等离子体科学学生的专业体验:参加 2018 年气体电子会议的学生旅行支持

基本信息

  • 批准号:
    1841343
  • 负责人:
  • 金额:
    $ 1.05万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2018
  • 资助国家:
    美国
  • 起止时间:
    2018-08-01 至 2019-07-31
  • 项目状态:
    已结题

项目摘要

This award will support student participation at the 71st Annual Gaseous Electronics Conference (GEC) is to be held November 5-8, 2018, in Portland, OR. The GEC has a long and venerable history in pursuit of the foundational physical and chemical processes occurring in partially ionized, collisional plasmas, encompassing the interactions between atoms, molecules, charged particles, photons, waves, and fields. The GEC has a strong tradition of encouraging and promoting student participation. Attending research conferences is an important educational experience for students that cannot be replicated at their home institutions. The GEC provides opportunities for students to expand their networks, to learn about cutting edge research, and to develop and hone their professional communication skills.The GEC is a place to welcome students into a global professional community where they can envision themselves spending their careers. The GEC program is organized with coffee breaks mid-morning and mid-afternoon, as a way of facilitating conversation among participants. At the 2018 GEC, intentional steps are being taken to create a more inclusive conference atmosphere for those from groups not well represented at the conference. These steps include a reconsideration of the GEC experience to add a commitment to diversity and inclusivity to its reputation as a premier venue for gaseous electronics research. Although demographic changes in research communities have slower time constants than might be desirable, the activities enabled by this award have the potential for long term impact by introducing new traditions into the GEC institutional memory. This approach includes introduction of several tested professional development and social events intended to appeal to early career attendees, including students and those from underrepresented groups. Questions added to the post-conference survey will help to assess need for, interest in and effectiveness of the added events, and responses will be used to guide planning for subsequent years.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
该奖项将支持学生参加将于2018年11月5日至8日在波特兰举行的第71届年度气体电子会议(GEC)。GEC在追求部分电离碰撞等离子体中发生的基础物理和化学过程方面有着悠久而悠久的历史,包括原子,分子,带电粒子,光子,波和场之间的相互作用。GEC有着鼓励和促进学生参与的悠久传统。参加研究会议是学生的一个重要的教育经验,不能在他们的家庭机构复制。GEC为学生提供了扩大网络、了解前沿研究、发展和磨练专业沟通技能的机会。GEC欢迎学生进入全球专业社区,在那里他们可以想象自己的职业生涯。GEC计划在上午和下午三点左右安排咖啡休息时间,以促进参与者之间的对话。在2018年GEC上,正在采取有意识的措施,为那些在会议上没有充分代表的团体创造更具包容性的会议氛围。 这些步骤包括重新考虑GEC的经验,以增加其作为气体电子研究首要场所的声誉的多样性和包容性。虽然研究社区的人口变化的时间常数比预期的要慢,但该奖项所支持的活动通过将新的传统引入GEC机构记忆而具有长期影响的潜力。这种方法包括介绍几个经过测试的专业发展和社会活动,旨在吸引早期的职业参与者,包括学生和那些代表性不足的群体。在会后调查中增加的问题将有助于评估对增加的活动的需求、兴趣和有效性,而回应将用于指导随后几年的规划。该奖项反映了NSF的法定使命,并被认为值得通过使用基金会的知识价值和更广泛的影响审查标准进行评估来支持。

项目成果

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Amy Wendt其他文献

Amy Wendt的其他文献

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{{ truncateString('Amy Wendt', 18)}}的其他基金

Non-Invasive Diagnostics of Molecular Gas Plasmas with Quantitative Optical Emission Spectroscopy
利用定量发射光谱法对分子气体等离子体进行非侵入性诊断
  • 批准号:
    1617602
  • 财政年份:
    2016
  • 资助金额:
    $ 1.05万
  • 项目类别:
    Continuing Grant
Elucidating Electron Kinetics in Low Temperature Plasmas with Non-Invasive Optical Diagnostics
通过非侵入性光学诊断阐明低温等离子体中的电子动力学
  • 批准号:
    1068670
  • 财政年份:
    2011
  • 资助金额:
    $ 1.05万
  • 项目类别:
    Continuing Grant
ITEST Strategy: Society's Grand Challenges in Engineering as a Context for Middle School Instruction in STEM
ITEST 策略:社会在工程领域面临的巨大挑战作为中学 STEM 教学的背景
  • 批准号:
    1030126
  • 财政年份:
    2010
  • 资助金额:
    $ 1.05万
  • 项目类别:
    Continuing Grant
Spectroscopic Diagnostics for Low Temperature Industrial Plasmas
低温工业等离子体的光谱诊断
  • 批准号:
    0714600
  • 财政年份:
    2007
  • 资助金额:
    $ 1.05万
  • 项目类别:
    Continuing Grant
Control of Ion Energy Distribution at Substrates during Plasma Processing
等离子体处理过程中基板上离子能量分布的控制
  • 批准号:
    0078522
  • 财政年份:
    2000
  • 资助金额:
    $ 1.05万
  • 项目类别:
    Continuing Grant

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