GOALI: Ternary Metal Diboride Coatings with Enhanced Oxidation Resistance and Durability - Understanding Phase Formation from a Metastable Starting State

GOALI：具有增强的抗氧化性和耐久性的三元金属二硼化物涂层 - 了解亚稳态起始状态的相形成

• 批准号: 1914769
• 负责人: Jessica Krogstad
• 金额: $ 64万
• 依托单位: University of Illinois at Urbana-Champaign
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2019
• 资助国家: 美国
• 起止时间: 2019-08-01 至 2024-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1914769&HistoricalAwards=false
• 关键词: GOALI; Ternary; Metal; Diboride; Coatings

NON-TECHNICAL DESCRIPTION: This project addresses the need to expand the performance of materials that resist wear at elevated temperatures in a wide range of applications from microelectronics to protective coatings for manufacturing. Such coatings are critical for ensuring component quality and reliability by reducing manufacturing flaws, reducing in-service damage and extending the lifetime of components in the field and in manufacturing processes - all of which will largely eliminate waste, inefficient operations and resource intensive redundancies. Improved coatings may also expand the design space, allowing engineers to make choices that are more sustainable or could improve performance but are otherwise impossible with existing technologies. Transition metal diborides have exceptional wear properties and are quite tolerant of high temperatures; however, the presence of oxygen in these service environments diminishes those properties. This research is coupling processing science with state of the art characterization tools to develop new coating chemistries in the diboride family that evolve to protect themselves in oxidizing environments. Moreover, the processing route uses chemically safe precursors and operates at lower temperatures, making it a sustainable alternative to many existing coating technologies. By engaging an industrial partner, UES Inc., though the GOALI program, this research is focused on industrially identified gaps in understanding and technology. Graduate student researchers are also benefiting from this close partnership, gaining invaluable training and professional skills by working directly with UES researchers. These graduate students will be well positioned to join companies across a wide spectrum of industries dependent on these protective coatings (e.g., automotive, microelectronics, aerospace, power generation, tooling, etc.) where they are very much in demand. Teaching, training and participation of underrepresented groups is being fostered through targeted recruitment of graduate students from the University of Illinois Support of Under-Represented Groups in Engineering (SURGE) program and undergraduate researchers from the Illinois Scholars Undergraduate Research (ISUR) program.TECHNICAL DETAILS: The overarching objective of this study is to establish the scientific underpinnings of a new sustainable kinetic route towards durable, oxidation resistant refractory diboride thin films of HfAlxBy and HfCrxBy. The initial metastable state is established through low temperature chemical vapor deposition and the use of chemically safe (halogen free) precursors. The PIs are committed to sustainable synthesis routes, specifically the co-PI is a co-founder and lead instructor in the 'Energy and Sustainability Engineering' graduate certificate and MEng degree programs at UI (http://EaSE.Illinois.edu). Once fabricated, film properties are evaluated in both as-deposited and annealed conditions using quantitative techniques, including transmission electron microscopy, electron energy loss spectroscopy, and energy dispersive X-ray spectroscopy. The results for film growth, microstructure and composition are then analyzed in terms of kinetic models for the component steps in the synthesis process. Additionally, in exploratory work, incorporation of Cr is examined using the Cr(B3H8)2 precursor developed by a collaborator. This precursor, which contains no heteroatoms other than hydrogen, has previously been demonstrated by the co-PI to deposit high quality CrB2 films, hence, it is expected to work well in combination with Hf(BH4)4. Film growth, including the pursuit and validation of chemically safe synthesis routes, analysis and testing actively involve the GOALI partner, UES Inc., facilitated by regular communication and extended visits of personnel between sites. Successful protocols are then transferred to industry.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

非技术描述：该项目解决了在从微电子到制造业保护涂层的广泛应用中扩大高温下耐磨材料性能的需求。此类涂层对于通过减少制造缺陷、减少使用中损坏以及延长现场和制造过程中组件的使用寿命来确保组件质量和可靠性至关重要-所有这些都将在很大程度上消除浪费、低效运营和资源密集型冗余。改进的涂层还可以扩大设计空间，使工程师能够做出更可持续的选择，或者可以提高性能，但在现有技术下是不可能的。过渡金属二硼化物具有特殊的耐磨性能，并且对高温具有相当的耐受性;然而，在这些服务环境中存在氧气会降低这些性能。这项研究将加工科学与最先进的表征工具相结合，以开发二硼化物家族中的新涂层化学物质，这些化学物质可以在氧化环境中保护自己。此外，该工艺路线使用化学安全的前体，并在较低的温度下操作，使其成为许多现有涂层技术的可持续替代品。 通过与工业合作伙伴UES Inc.合作，通过GOALI计划，这项研究的重点是工业上确定的理解和技术差距。 研究生研究人员也从这种密切的伙伴关系中受益，通过直接与UES研究人员合作获得宝贵的培训和专业技能。这些研究生将能够很好地加入依赖这些保护涂层的广泛行业的公司（例如，汽车、微电子、航空航天、发电、工具等）在那里它们非常受欢迎。通过有针对性地招募伊利诺伊大学支持工程学中代表性不足群体（SURGE）项目的研究生和伊利诺伊大学学者本科生研究（ISUR）项目的本科生研究人员，促进代表性不足群体的教学、培训和参与。这项研究的总体目标是建立一个新的可持续动力学路线的科学基础，HfAlxBy和HfCrxBy的抗氧化难熔二硼化物薄膜。通过低温化学气相沉积和使用化学安全（无卤素）前体建立初始亚稳态。PI致力于可持续的合成路线，特别是联合PI是UI（http：//www.example.com）“能源和可持续发展工程”研究生证书和MEng学位课程的联合创始人和首席讲师。EaSE.Illinois.edu 一旦制造，薄膜性能进行评估，在这两个沉积和退火条件下使用定量技术，包括透射电子显微镜，电子能量损失谱，和能量色散X射线光谱。薄膜生长，微观结构和组合物的结果，然后分析在合成过程中的组件步骤的动力学模型。此外，在探索性工作中，使用合作者开发的Cr（B3 H8）2前体检查Cr的掺入。该前体不含除氢以外的杂原子，先前已通过共PI来证明其可存款高质量CrB 2膜，因此，预期其与Hf（BH 4）4组合良好地工作。薄膜生长，包括化学安全合成路线的追求和验证，分析和测试积极参与GOALI合作伙伴，UES公司，通过定期沟通和工作人员在各地点之间的长期访问来促进。该奖项反映了NSF的法定使命，并通过使用基金会的知识价值和更广泛的影响审查标准进行评估，被认为值得支持。

项目成果

Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates

通过原子层沉积或化学气相沉积实现超薄膜的聚结：基于成核和生长速率的最小厚度模型

• DOI: 10.1116/6.0001562
• 发表时间: 2022
• 期刊: Journal of Vacuum Science & Technology A
• 影响因子: 2.9
• 作者: LaFollette, Diana K.;Canova, Kinsey L.;Zhang, Zhejun V.;Abelson, John R.
• 通讯作者: Abelson, John R.

Superconformal chemical vapor deposition using plasma-generated atomic species as a consumable growth inhibitor

使用等离子体产生的原子物种作为消耗性生长抑制剂的超共形化学气相沉积

• DOI: 10.1116/6.0001018
• 发表时间: 2021
• 期刊: Journal of Vacuum Science & Technology A
• 影响因子: 2.9
• 作者: Yang, Yu;Canova, Kinsey L.;Jayaraman, Sreenivas;Kim, Do-Young;Girolami, Gregory S.;Abelson, John R.
• 通讯作者: Abelson, John R.