EAGER: Collaborative Research: Epitaxial Stabilization of Polar Epsilon-phase Gallium Oxide Thin Films
EAGER: Collaborative Research: Epitaxial Stabilization of Polar Epsilon-phase Gallium Oxide Thin Films
批准号:
1931652
负责人:
Sriram Krishnamoorthy
金额:
$8.5万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2019
资助国家:
美国
项目状态:
已结题
起止时间:
2019-08-01 至 2021-07-31
中文摘要
非技术描述:半导体和铁电体是无处不在的电子材料。在半导体中,电导率可以通过掺杂来调节,并且用于器件应用的典型半导体中载流子的速度很大。铁电材料表现出固有的电极化,可以使用外电场反转;然而,铁电体中的载流子通常具有较低的电子速度。这项研究旨在通过稳定一种基于氧化镓亚稳相的新型铁电半导体,将这两种特性结合在一个材料中。该项目是对epsilon相氧化镓的结构和合成条件如何影响其材料性质的基本理解的早期努力。理论研究和预测指导实验工作。通过将半导体和铁电体的特性结合在epsilon相氧化镓中,该项目旨在释放其潜力,前景和限制,用于具有多种功能的设备,如功率,高频和内存,所有这些都在单一材料平台中。该项目为本科生、研究生和博士后学者提供培训,将理论与建模、先进材料合成和材料表征相结合,以开发这种新型材料的基本结构-性能相关性。技术描述:氧化镓的亚稳,epsilon相被预测为一种罕见的铁电半导体,具有超宽的带隙。本项目旨在利用外延稳定epsilon相氧化镓,并演示极性域的电场开关。该研究采用第一性原理密度泛函理论计算和金属有机气相外延相结合的方法,在各种预测衬底上生长epsilon氧化镓薄膜并控制其质量。它使用各种表征技术,包括像差校正扫描透射电子显微镜,来表征沉积薄膜的结构、电学、光学和极性特性,并开发结构-性能-加工的相关性。基于ε相氧化镓的高质量铁电半导体的实现有望为设计用于电力和高频电子、信息存储和处理应用的新型器件开辟道路。教育和推广方面包括对本科生和研究生的培训,以及为犹他州地区学校的高中生和教师组织一个暑期项目,让他们到犹他州纳米厂和外延工厂接触纳米技术。该奖项反映了美国国家科学基金会的法定使命,并通过使用基金会的知识价值和更广泛的影响审查标准进行评估,被认为值得支持。
英文摘要
Non-technical description: Semiconductors and ferroelectrics are ubiquitous electronic materials. In semiconductors, the conductivity can be tuned using doping and the velocity of charge carriers in typical semiconductors used for device applications is large. Ferroelectric materials exhibit inherent electric polarization that can be reversed using an external electric field; however charge carriers in ferroelectrics typically have lower electron velocity. This research aims at combining both the properties in a single material by stabilizing a new ferroelectric semiconductor based on the metastable, epsilon phase of gallium oxide. This project is an early effort on developing a fundamental understanding of how the structure and synthesis conditions of epsilon-phase gallium oxide affects its material properties. Theoretical studies and predictions guide the experimental efforts. By combining the properties of semiconductors and ferroelectrics in epsilon-phase gallium oxide, this project aims to unlock its potential, prospects and limitation for devices with multiple functionalities, such as power, high frequency, and memory, all in a single materials platform. The project provides training to undergraduate and graduate students and a post-doctoral scholar to synergistically combine theory and modeling, advanced material synthesis, and materials characterization to develop fundamental structure-property correlations in this new class of materials. Technical description: The metastable, epsilon phase of gallium oxide has been predicted to be a rare, ferroelectric semiconductor with an ultra-wide band gap. This project seeks to stabilize epsilon-phase gallium oxide using epitaxy and demonstrate electric-field switching of polar domains. The research employs a combination of first-principles density-functional theory calculations and metal-organic vapor phase epitaxy to grow epsilon gallium oxide thin films on various predicted substrates and control their quality. It uses a variety of characterization techniques, including aberration-corrected scanning transmission electron microscopy, to characterize the structure, electrical, optical and polar properties of the deposited thin-films and develop structure-property-processing correlations. The realization of high-quality ferroelectric semiconductor based on epsilon-phase gallium oxide is expected to open up pathways to design novel devices for power and high-frequency electronics, information storage and processing applications. Education and outreach aspects include training of undergraduate and graduate students and the organization of a summer program for high-school students and teachers from Utah-region schools to the Utah Nanofab and epitaxy facility to provide exposure to nanotechnology.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
期刊论文(4)
专著(0)
科研奖励(0)
会议论文
In Situ Dielectric Al 2 O 3 /β‐Ga 2 O 3 Interfaces Grown Using Metal–Organic Chemical Vapor Deposition
使用金属有机化学气相沉积生长的原位电介质 Al 2 O 3 /β-Ga 2 O 3 界面
DOI:
10.1002/aelm.202100333
发表时间:
2021
期刊:
Advanced Electronic Materials
影响因子:
6.2
作者:
[Roy, Saurav, Chmielewski, Adrian E., Bhattacharyya, Arkka, Ranga, Praneeth, Sun, Rujun, Scarpulla, Michael A., Alem, Nasim, Krishnamoorthy, Sriram]
通讯作者:
Krishnamoorthy, Sriram
海外基金