Collaborative Research: ECCS-EPSRC: Nitride Super-Junction HEMTs for Robust, Efficient, Fast Power Switching
Collaborative Research: ECCS-EPSRC: Nitride Super-Junction HEMTs for Robust, Efficient, Fast Power Switching
批准号:
2036740
负责人:
Yuhao Zhang
金额:
$23.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2021
资助国家:
美国
项目状态:
已结题
起止时间:
2021-02-01 至 2024-01-31
中文摘要
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英文摘要
Award AbstractProposal Number: 2036740 & 2036915Principal Investigator: Yuhao Zhang and Han Wang (co-PI)Title: Collaborative Research: ECCS-EPSRC: Nitride Super-Junction HEMTs for Robust, Efficient, Fast Power SwitchingInstitution: Virginia Polytechnic Institute and State University (Lead) and University of Southern CaliforniaNon-Technical Abstract:Power semiconductor devices are regularly utilized as solid-state switches in power electronic systems that are widely used in consumer electronics, data centers, electric vehicles, electricity grid, and renewable energy systems. The global power device market exceeds $15 billion in 2019 and is fast growing. Gallium nitride (GaN) high-electron-mobility transistors (HEMTs) are commonly perceived as the next generation of power devices. Despite their initial commercialization recently, their wide adoption in industrial applications is hindered by the limitation in reliability and robustness, resulting in considerable over design, rendering device performance far below the material limit. This project will develop a new generation of robust, charge-balanced GaN HEMTs through innovation in the semiconductor materials and device structure. Interdisciplinary research will be carried out in materials, devices, fabrication processes, and circuit-level tests through collaboration between Virginia Tech and the University of Southern California in the United States, as well as University of Cambridge in United Kingdom under the “NSF Engineering - UKRI Engineering and Physical Sciences Research Council Lead Agency Opportunity (ENG-EPSRC)”. This US-UK collaborative project provides opportunities for student education and international exchange, development of cross-university teaching modules, and industrial collaboration for potential technology transfer. This interdisciplinary, cross-continent project also involves outreach activities for K-12 students and teachers, and promotes educational activities related to microelectronics and power electronics technologies.Technical Abstract:This overarching hypothesis is that robust gallium nitride (GaN) high-electron-mobility transistors (HEMTs) can be implemented by selective-area, nearly defect-free embedding of p-type regions into the two-dimensional electron gas (2DEG) channel, forming a novel charge-balanced super-junction structure. This novel 2D-3D super-junction structure can not only enhance the device robustness by managing the electric field and avalanche capability, but also allow significantly higher 2DEG density while maintaining the normally-off operation, thereby decreasing the device specific on-resistance and boosting its switching frequency. Despite these promises, major gaps exist in the device physics of the novel super-junction, interfacial material properties, and the dynamic performance of super-junction HEMTs in power electronic circuits. Funded by the “NSF Engineering - UKRI Engineering and Physical Sciences Research Council Lead Agency Opportunity (ENG-EPSRC)”, this project aims to address the scientific knowledge gaps in four relevant areas through the US-UK research collaboration: (a) to explore the design space and performance limits of the novel super-junction HEMT device; (b) to probe new methods of selectively introducing p-type dopants into the 2DEG channel to realize the super-junction functionality; (c) to develop an in-depth understanding of the dopant profiles, carrier transport, and trap dynamics in the nitride super-junction structure; and (d) to correlate the nano/mesoscale materials and interface properties with the dynamic characteristics and robustness of GaN HEMTs.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
期刊论文(12)
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A perspective on multi-channel technology for the next-generation of GaN power devices
下一代 GaN 功率器件多通道技术的视角
DOI:
10.1063/5.0086978
发表时间:
2022
期刊:
Applied Physics Letters
影响因子:
4
作者:
[Nela, Luca, Xiao, Ming, Zhang, Yuhao, Matioli, Elison]
通讯作者:
Matioli, Elison
10 kV GaN Power Diodes and Transistors with Performance beyond SiC Limit
性能超越 SiC 极限的 10 kV GaN 功率二极管和晶体管
DOI:
10.1109/edtm53872.2022.9797920
发表时间:
2022
期刊:
10 kV GaN Power Diodes and Transistors with Performance beyond SiC Limit
影响因子:
--
作者:
[Zhang, Yuhao, Xiao, Ming, Ma, Yunwei, Cheng, Kai]
通讯作者:
Cheng, Kai
First Demonstration of Vertical Superjunction Diode in GaN
GaN 垂直超结二极管的首次演示
DOI:
10.1109/iedm45625.2022.10019405
发表时间:
2022
期刊:
First Demonstration of Vertical Superjunction Diode in GaN
影响因子:
--
作者:
[Xiao, Ming, Ma, Yunwei, Du, Zhonghao, Qin, Yuan, Liu, Kai, Cheng, Kai, Udrea, Florin, Xie, Andy, Beam, Edward, Wang, Boyan]
通讯作者:
Wang, Boyan
Tri-Gate GaN Junction HEMTs: Physics and Performance Space
三栅 GaN 结 HEMT:物理和性能空间
DOI:
10.1109/ted.2021.3103157
发表时间:
2021
期刊:
IEEE Transactions on Electron Devices
影响因子:
3.1
作者:
[Ma, Yunwei, Xiao, Ming, Du, Zhonghao, Wang, Han, Zhang, Yuhao]
通讯作者:
Zhang, Yuhao
(Invited) Multi-Channel AlGaN/GaN Power Rectifiers: Breakthrough Performance up to 10 kV
(特邀)多通道 AlGaN/GaN 功率整流器:高达 10 kV 的突破性性能
DOI:
10.1149/10404.0051ecst
发表时间:
2021
期刊:
ECS Transactions
影响因子:
--
作者:
[Zhang, Yuhao, Xiao, Ming, Ma, Yunwei, Du, Zhonghao, Wang, Han, Xie, Andy, Beam, Edward, Cao, Yu, Cheng, Kai]
通讯作者:
Cheng, Kai
共 11 条
ASCENT: Optically-Driven Ultra-Wide-Bandgap Power Electronics for Grid Energy Conversion
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批准号:2230412
-
项目类别:Standard Grant
-
资助金额:$150.0万
-
财政年份:2022
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负责人:Yuhao Zhang
-
依托单位:
CAREER: Nitride FinFET on Silicon for Medium-Voltage Monolithically Integrated Power Electronics
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批准号:2045001
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项目类别:Continuing Grant
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资助金额:$50.0万
-
财政年份:2021
-
负责人:Yuhao Zhang
-
依托单位:
FMSG: Cyber: Cybermanufacturing of Wide-Bandgap Semiconductor Devices Enabled by Simulation Augmented Machine Learning
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批准号:2134374
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项目类别:Standard Grant
-
资助金额:$50.0万
-
财政年份:2021
-
负责人:Yuhao Zhang
-
依托单位:
国内基金
海外基金
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批准号:24ZR1403900
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项目类别:省市级项目
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资助金额:--
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批准年份:2024
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负责人:SATOSHI NAWATA
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依托单位:
Cell Research
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批准号:31224802
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项目类别:专项基金项目
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资助金额:24.0万元
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负责人:程磊
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依托单位:
Cell Research
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批准号:31024804
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项目类别:专项基金项目
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资助金额:24.0万元
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批准年份:2010
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负责人:程磊
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依托单位:
Cell Research (细胞研究)
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批准号:30824808
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项目类别:专项基金项目
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资助金额:24.0万元
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批准年份:2008
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负责人:张爱兰
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依托单位:
Research on the Rapid Growth Mechanism of KDP Crystal
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批准号:10774081
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项目类别:面上项目
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批准年份:2007
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负责人:滕冰
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依托单位: